FOCUS MONITORING METHOD OF EXPOSURE DEVICE AND EXPOSURE METHOD USING THE SAME

PROBLEM TO BE SOLVED: To monitor a focus value of an exposure device during production in photolithography. SOLUTION: CD focus curves 2a and 4a of two patterns different in a best focus and a CD focus curve 12a of one pattern deciding a reference of a size are formed. Exposure of an exposure device...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	ASAHI KENICHI, NISHINO KATSUHIRO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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