FINE PROCESSING METHOD AND FINE PROCESSING DEVICE

PROBLEM TO BE SOLVED: To provide a fine processing method for manufacturing a thin-film workpiece with high processing accuracy; and to provide its device. SOLUTION: A processing cross-sectional surface 10 of a workpiece 4 is formed on an ion beam-irradiated side surface 26 obtained by moving a radi...

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Bibliographische Detailangaben
1. Verfasser: INUI MITSUTAKA
Format: Patent
Sprache:eng
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