TRANSPARENT ELECTROCONDUCTIVE FILM AND MANUFACTURING METHOD THEREFOR
PROBLEM TO BE SOLVED: To provide a superior ITO-based transparent electroconductive film for a touch panel, which has many protrusions on the surface and does not stick to an opposite glass substrate or film. SOLUTION: The method for manufacturing the transparent electroconductive film with a DC mag...
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| creator | IIGUSA HITOSHI UCHIUMI KENTARO |
| description | PROBLEM TO BE SOLVED: To provide a superior ITO-based transparent electroconductive film for a touch panel, which has many protrusions on the surface and does not stick to an opposite glass substrate or film. SOLUTION: The method for manufacturing the transparent electroconductive film with a DC magnetron sputtering method comprises: using a target consisting of indium, tin and oxygen, or a target consisting of indium, tin, magnesium and oxygen; setting a magnetic flux density of a horizontal component on the target to 300 G or less; and performing sputtering. Thus formed transparent electroconductive film has both of two types of protrusions with heights of 20 to 60 nm and heights of 1.5 to 5 nm, on the surface. COPYRIGHT: (C)2005,JPO&NCIPI |
| format | Patent |
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SOLUTION: The method for manufacturing the transparent electroconductive film with a DC magnetron sputtering method comprises: using a target consisting of indium, tin and oxygen, or a target consisting of indium, tin, magnesium and oxygen; setting a magnetic flux density of a horizontal component on the target to 300 G or less; and performing sputtering. Thus formed transparent electroconductive film has both of two types of protrusions with heights of 20 to 60 nm and heights of 1.5 to 5 nm, on the surface. 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SOLUTION: The method for manufacturing the transparent electroconductive film with a DC magnetron sputtering method comprises: using a target consisting of indium, tin and oxygen, or a target consisting of indium, tin, magnesium and oxygen; setting a magnetic flux density of a horizontal component on the target to 300 G or less; and performing sputtering. Thus formed transparent electroconductive film has both of two types of protrusions with heights of 20 to 60 nm and heights of 1.5 to 5 nm, on the surface. COPYRIGHT: (C)2005,JPO&NCIPI</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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| subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | TRANSPARENT ELECTROCONDUCTIVE FILM AND MANUFACTURING METHOD THEREFOR |
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