FLAT SURFACE OPTICAL CIRCUIT AND ITS MANUFACTURING METHOD

FLAT SURFACE OPTICAL CIRCUIT AND ITS MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To eliminate mirror angle errors within a wafer surface in a flat surface optical circuit with a micromirror manufactured by using a diagonal vapor deposition process. SOLUTION: In the flat surface optical circuit having a plurality of optical path changing mirrors within a sub...

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Hauptverfasser: ISHII MOTOHAYA, OGAWA IKUO, DOI YOSHIYUKI, TERUI HIROSHI, SUZUKI SENTA, NIITSU TOMOHARU, SHIMIZU KAZUMI
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Sprache:eng
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OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
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creator ISHII MOTOHAYA
OGAWA IKUO
DOI YOSHIYUKI
TERUI HIROSHI
SUZUKI SENTA
NIITSU TOMOHARU
SHIMIZU KAZUMI
description PROBLEM TO BE SOLVED: To eliminate mirror angle errors within a wafer surface in a flat surface optical circuit with a micromirror manufactured by using a diagonal vapor deposition process. SOLUTION: In the flat surface optical circuit having a plurality of optical path changing mirrors within a substrate, a mirror surface direction (β) is so set that the prescribed mirror angle (δ) can be obtained based on the positional relations (D and θ) on the vapor deposition source and the substrate surface in a diagonal vapor deposition process. Namely, the respective mirror manufacturing positions (x and y) and mirror surface direction (β) are controlled by using prescribed formulas 1 and 2 in such a manner that the prescribed mirror angles (δ) (uniform within the substrate) can be obtained based on the positional relations between a vapor deposition source and the manufacturing positions (x and y) of the respective mirrors on the substrate in order to manufacture a plurality of the mirrors with good uniformity within the substrate using the diagonal vapor deposition process. The formulas 1 and 2 are similarly applicable in the case of using diagonal exposure in place of the diagonal vapor deposition. COPYRIGHT: (C)2005,JPO&NCIPI
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SOLUTION: In the flat surface optical circuit having a plurality of optical path changing mirrors within a substrate, a mirror surface direction (β) is so set that the prescribed mirror angle (δ) can be obtained based on the positional relations (D and θ) on the vapor deposition source and the substrate surface in a diagonal vapor deposition process. Namely, the respective mirror manufacturing positions (x and y) and mirror surface direction (β) are controlled by using prescribed formulas 1 and 2 in such a manner that the prescribed mirror angles (δ) (uniform within the substrate) can be obtained based on the positional relations between a vapor deposition source and the manufacturing positions (x and y) of the respective mirrors on the substrate in order to manufacture a plurality of the mirrors with good uniformity within the substrate using the diagonal vapor deposition process. The formulas 1 and 2 are similarly applicable in the case of using diagonal exposure in place of the diagonal vapor deposition. 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The formulas 1 and 2 are similarly applicable in the case of using diagonal exposure in place of the diagonal vapor deposition. 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subjects OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
title FLAT SURFACE OPTICAL CIRCUIT AND ITS MANUFACTURING METHOD
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