MAGNETIC MEMORY CELL, ITS FORMING METHOD, MAGNETIC MEMORY ARRAY, AND ITS MANUFACTURING METHOD
PROBLEM TO BE SOLVED: To provide a method of forming magnetic memory cells, in which magnetic influence from the ambience is reduced, and magnetic information can be read stably. SOLUTION: The method includes a stage of forming a MTJ element 20A comprising a magnetization free layer 25 covered with...
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creator | HONG LIUBO HAN CHERNGYI |
description | PROBLEM TO BE SOLVED: To provide a method of forming magnetic memory cells, in which magnetic influence from the ambience is reduced, and magnetic information can be read stably. SOLUTION: The method includes a stage of forming a MTJ element 20A comprising a magnetization free layer 25 covered with a cap layer 30 and a protective layer 50 on an electrode layer 10, a stage of forming a first insulating layer 41 so as to cover the whole, a stage of performing flattening treatment over the entire surface so that one portion (residual portion 52) in a thickness direction of the protective layer 50 is left, a stage of removing the residual portion 52 entirely so that the upper surface of the cap layer 30 may be exposed, a step of forming a bit line 60 so that the upper surface 30S of the cap layer 30 may be covered, and a step of filling the periphery of the bit line 60, and forming a second insulating layer 42 so that a flat surface F1 contiguous to the upper surface of the bit line 60 may be constituted. Therefore, the distance of the thickness direction of the magnetization free layer 25 and a first current line 60 can be uniform and precise over the whole based on the thickness of the cap layer 30. COPYRIGHT: (C)2005,JPO&NCIPI |
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fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2005175493A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2005175493A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2005175493A3</originalsourceid><addsrcrecordid>eNrjZIj1dXT3cw3xdFbwdfX1D4pUcHb18dFR8AwJVnDzD_L19HMHSoR4-LvoKKCrdAwKcozUUXD0cwEr93X0C3VzdA4JDUJo4mFgTUvMKU7lhdLcDEpuriHOHrqpBfnxqcUFicmpeakl8V4BRgYGpobmpiaWxo7GRCkCABrxMsA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>MAGNETIC MEMORY CELL, ITS FORMING METHOD, MAGNETIC MEMORY ARRAY, AND ITS MANUFACTURING METHOD</title><source>esp@cenet</source><creator>HONG LIUBO ; HAN CHERNGYI</creator><creatorcontrib>HONG LIUBO ; HAN CHERNGYI</creatorcontrib><description>PROBLEM TO BE SOLVED: To provide a method of forming magnetic memory cells, in which magnetic influence from the ambience is reduced, and magnetic information can be read stably. SOLUTION: The method includes a stage of forming a MTJ element 20A comprising a magnetization free layer 25 covered with a cap layer 30 and a protective layer 50 on an electrode layer 10, a stage of forming a first insulating layer 41 so as to cover the whole, a stage of performing flattening treatment over the entire surface so that one portion (residual portion 52) in a thickness direction of the protective layer 50 is left, a stage of removing the residual portion 52 entirely so that the upper surface of the cap layer 30 may be exposed, a step of forming a bit line 60 so that the upper surface 30S of the cap layer 30 may be covered, and a step of filling the periphery of the bit line 60, and forming a second insulating layer 42 so that a flat surface F1 contiguous to the upper surface of the bit line 60 may be constituted. Therefore, the distance of the thickness direction of the magnetization free layer 25 and a first current line 60 can be uniform and precise over the whole based on the thickness of the cap layer 30. COPYRIGHT: (C)2005,JPO&NCIPI</description><edition>7</edition><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INDUCTANCES ; INFORMATION STORAGE ; MAGNETS ; PHYSICS ; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES ; SEMICONDUCTOR DEVICES ; STATIC STORES ; TRANSFORMERS</subject><creationdate>2005</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20050630&DB=EPODOC&CC=JP&NR=2005175493A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76318</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20050630&DB=EPODOC&CC=JP&NR=2005175493A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HONG LIUBO</creatorcontrib><creatorcontrib>HAN CHERNGYI</creatorcontrib><title>MAGNETIC MEMORY CELL, ITS FORMING METHOD, MAGNETIC MEMORY ARRAY, AND ITS MANUFACTURING METHOD</title><description>PROBLEM TO BE SOLVED: To provide a method of forming magnetic memory cells, in which magnetic influence from the ambience is reduced, and magnetic information can be read stably. SOLUTION: The method includes a stage of forming a MTJ element 20A comprising a magnetization free layer 25 covered with a cap layer 30 and a protective layer 50 on an electrode layer 10, a stage of forming a first insulating layer 41 so as to cover the whole, a stage of performing flattening treatment over the entire surface so that one portion (residual portion 52) in a thickness direction of the protective layer 50 is left, a stage of removing the residual portion 52 entirely so that the upper surface of the cap layer 30 may be exposed, a step of forming a bit line 60 so that the upper surface 30S of the cap layer 30 may be covered, and a step of filling the periphery of the bit line 60, and forming a second insulating layer 42 so that a flat surface F1 contiguous to the upper surface of the bit line 60 may be constituted. Therefore, the distance of the thickness direction of the magnetization free layer 25 and a first current line 60 can be uniform and precise over the whole based on the thickness of the cap layer 30. COPYRIGHT: (C)2005,JPO&NCIPI</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INDUCTANCES</subject><subject>INFORMATION STORAGE</subject><subject>MAGNETS</subject><subject>PHYSICS</subject><subject>SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>STATIC STORES</subject><subject>TRANSFORMERS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2005</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZIj1dXT3cw3xdFbwdfX1D4pUcHb18dFR8AwJVnDzD_L19HMHSoR4-LvoKKCrdAwKcozUUXD0cwEr93X0C3VzdA4JDUJo4mFgTUvMKU7lhdLcDEpuriHOHrqpBfnxqcUFicmpeakl8V4BRgYGpobmpiaWxo7GRCkCABrxMsA</recordid><startdate>20050630</startdate><enddate>20050630</enddate><creator>HONG LIUBO</creator><creator>HAN CHERNGYI</creator><scope>EVB</scope></search><sort><creationdate>20050630</creationdate><title>MAGNETIC MEMORY CELL, ITS FORMING METHOD, MAGNETIC MEMORY ARRAY, AND ITS MANUFACTURING METHOD</title><author>HONG LIUBO ; HAN CHERNGYI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2005175493A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2005</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INDUCTANCES</topic><topic>INFORMATION STORAGE</topic><topic>MAGNETS</topic><topic>PHYSICS</topic><topic>SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>STATIC STORES</topic><topic>TRANSFORMERS</topic><toplevel>online_resources</toplevel><creatorcontrib>HONG LIUBO</creatorcontrib><creatorcontrib>HAN CHERNGYI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HONG LIUBO</au><au>HAN CHERNGYI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>MAGNETIC MEMORY CELL, ITS FORMING METHOD, MAGNETIC MEMORY ARRAY, AND ITS MANUFACTURING METHOD</title><date>2005-06-30</date><risdate>2005</risdate><abstract>PROBLEM TO BE SOLVED: To provide a method of forming magnetic memory cells, in which magnetic influence from the ambience is reduced, and magnetic information can be read stably. SOLUTION: The method includes a stage of forming a MTJ element 20A comprising a magnetization free layer 25 covered with a cap layer 30 and a protective layer 50 on an electrode layer 10, a stage of forming a first insulating layer 41 so as to cover the whole, a stage of performing flattening treatment over the entire surface so that one portion (residual portion 52) in a thickness direction of the protective layer 50 is left, a stage of removing the residual portion 52 entirely so that the upper surface of the cap layer 30 may be exposed, a step of forming a bit line 60 so that the upper surface 30S of the cap layer 30 may be covered, and a step of filling the periphery of the bit line 60, and forming a second insulating layer 42 so that a flat surface F1 contiguous to the upper surface of the bit line 60 may be constituted. Therefore, the distance of the thickness direction of the magnetization free layer 25 and a first current line 60 can be uniform and precise over the whole based on the thickness of the cap layer 30. COPYRIGHT: (C)2005,JPO&NCIPI</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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subjects | BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INDUCTANCES INFORMATION STORAGE MAGNETS PHYSICS SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES SEMICONDUCTOR DEVICES STATIC STORES TRANSFORMERS |
title | MAGNETIC MEMORY CELL, ITS FORMING METHOD, MAGNETIC MEMORY ARRAY, AND ITS MANUFACTURING METHOD |
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