ALIGNER AND METHOD FOR MANUFACTURING SAME

PROBLEM TO BE SOLVED: To provide an aligner that can keep a predetermined space in the exposure device, e.g. the optical path space for an exposure light to be clean, and to provide a method for manufacturing a device using the aligner. SOLUTION: The aligner is provided with a main unit to transfer...

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Bibliographische Detailangaben
Hauptverfasser:	MOTOISHI YASUO, YAMASHITA OSAMU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide an aligner that can keep a predetermined space in the exposure device, e.g. the optical path space for an exposure light to be clean, and to provide a method for manufacturing a device using the aligner. SOLUTION: The aligner is provided with a main unit to transfer a mask pattern to a substrate and an isolation member to isolate the predetermined space in the main unit from an outside air. The isolation member is provided with a first thin film 58 made of an elastic first material, a second thin film 55 made of a second material for blocking the entry of the outside air into the predetermined space, and a metal film 56 provided between the first thin film 58 and the second thin film 55. COPYRIGHT: (C)2005,JPO&NCIPI