LITHOGRAPHIC EQUIPMENT, DEVICE MANUFACTURING METHOD, AND POSITIONING SYSTEM

PROBLEM TO BE SOLVED: To provide lithographic equipment, a device manufacturing method, and a positioning system. SOLUTION: The lithographic equipment comprises the positioning system having a first and a second electromagnetic actuators. Each actuator comprises two electromagnetic elements which mu...

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Bibliographische Detailangaben
Hauptverfasser:	BUIS EDWIN JOHAN, HOL SVEN ANTOIN JOHAN, VREUGDEWATER PATRICIA
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY CONVERSION OR DISTRIBUTION OF ELECTRIC POWER DYNAMO-ELECTRIC MACHINES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY GENERATION HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide lithographic equipment, a device manufacturing method, and a positioning system. SOLUTION: The lithographic equipment comprises the positioning system having a first and a second electromagnetic actuators. Each actuator comprises two electromagnetic elements which mutually working together. These electromagnetic elements can move, with respect to each other by a force acting on the elements of each actuator. At least one side of the actuators comprises a shield for shielding one side of the actuators against a place generated by the other side of the actuators. This method can prevent a shielded actuator from being acted upon by a jamming force generated by the field. Further, a positioning system having actuators such as these is included. COPYRIGHT: (C)2005,JPO&NCIPI