TRANSFER MASK FOR CHARGED PARTICLE BEAM AND MANUFACTURING METHOD THEREOF

PROBLEM TO BE SOLVED: To provide a stencil mask which is used for the EPL system and LEEPL system using the electron beam as the light source to reduce influence on the quality to the pattern, accurately detect the location accuracy of pattern to be transferred within the transfer region and is give...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KUROSAWA HIDE, HOGEN MORIHISA, SANO NAOTAKE, FUJITA HIROSHI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!