INDUCTOR AND MANUFACTURING METHOD THEREOF
PROBLEM TO BE SOLVED: To provide an inductor and a manufacturing method thereof, wherein a plurality of turns and layers of a wiring pattern in each layer are enabled and has intended high inductance and low DC resistance, and to provide a manufacturing therefor. SOLUTION: An inductance 1 is constit...
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creator | NAKADA YASUHIRO KUDO NORIZANE KAWAGUCHI MASAHIKO |
description | PROBLEM TO BE SOLVED: To provide an inductor and a manufacturing method thereof, wherein a plurality of turns and layers of a wiring pattern in each layer are enabled and has intended high inductance and low DC resistance, and to provide a manufacturing therefor. SOLUTION: An inductance 1 is constituted of a laminated body 2 and terminal electrodes 3-1, 3-2. The laminated body 2 has a structure obtained, by alternately laminating insulating layers 40 to 44 and wiring patterns 50 to 53. Specifically, a photosensitive electrode paste is coated on the insulating layer 40 (41 to 43), which is exposed and developed by a photolithographic method, to form the wiring pattern 50 (51 to 53). Also, a photosensitive insulating paste is coated on the wiring pattern 50 (51, 52), which is exposed and developed by the photolithographic method, to form the insulating layer 41 (42, 43) having a via hole 41a (42a, 43a). The uppermost wiring pattern 53 is coated with the insulating layer 44 for protection. COPYRIGHT: (C)2005,JPO&NCIPI |
format | Patent |
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SOLUTION: An inductance 1 is constituted of a laminated body 2 and terminal electrodes 3-1, 3-2. The laminated body 2 has a structure obtained, by alternately laminating insulating layers 40 to 44 and wiring patterns 50 to 53. Specifically, a photosensitive electrode paste is coated on the insulating layer 40 (41 to 43), which is exposed and developed by a photolithographic method, to form the wiring pattern 50 (51 to 53). Also, a photosensitive insulating paste is coated on the wiring pattern 50 (51, 52), which is exposed and developed by the photolithographic method, to form the insulating layer 41 (42, 43) having a via hole 41a (42a, 43a). The uppermost wiring pattern 53 is coated with the insulating layer 44 for protection. 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SOLUTION: An inductance 1 is constituted of a laminated body 2 and terminal electrodes 3-1, 3-2. The laminated body 2 has a structure obtained, by alternately laminating insulating layers 40 to 44 and wiring patterns 50 to 53. Specifically, a photosensitive electrode paste is coated on the insulating layer 40 (41 to 43), which is exposed and developed by a photolithographic method, to form the wiring pattern 50 (51 to 53). Also, a photosensitive insulating paste is coated on the wiring pattern 50 (51, 52), which is exposed and developed by the photolithographic method, to form the insulating layer 41 (42, 43) having a via hole 41a (42a, 43a). The uppermost wiring pattern 53 is coated with the insulating layer 44 for protection. 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SOLUTION: An inductance 1 is constituted of a laminated body 2 and terminal electrodes 3-1, 3-2. The laminated body 2 has a structure obtained, by alternately laminating insulating layers 40 to 44 and wiring patterns 50 to 53. Specifically, a photosensitive electrode paste is coated on the insulating layer 40 (41 to 43), which is exposed and developed by a photolithographic method, to form the wiring pattern 50 (51 to 53). Also, a photosensitive insulating paste is coated on the wiring pattern 50 (51, 52), which is exposed and developed by the photolithographic method, to form the insulating layer 41 (42, 43) having a via hole 41a (42a, 43a). The uppermost wiring pattern 53 is coated with the insulating layer 44 for protection. COPYRIGHT: (C)2005,JPO&NCIPI</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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subjects | BASIC ELECTRIC ELEMENTS ELECTRICITY INDUCTANCES MAGNETS SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES TRANSFORMERS |
title | INDUCTOR AND MANUFACTURING METHOD THEREOF |
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