METHOD FOR MANUFACTURING ELECTROPHOTOGRAPHIC PHOTORECEPTOR AND THE PHOTORECEPTOR
PROBLEM TO BE SOLVED: To provide a method for manufacturing an electrophotographic photoreceptor capable of efficiently forming an excellent photosensitive layer free of coating application unevenness on a substrate even when a wiping off treatment and a drying process are not carried out after imme...
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creator | MORITA TATSUHIRO TAKANO KATSUYA MIMURA SHINYA |
description | PROBLEM TO BE SOLVED: To provide a method for manufacturing an electrophotographic photoreceptor capable of efficiently forming an excellent photosensitive layer free of coating application unevenness on a substrate even when a wiping off treatment and a drying process are not carried out after immersion coating application of a charge generating layer (CGL) and the photoreceptor. SOLUTION: The method for manufacturing the electrophotographic photoreceptor comprises forming the photosensitive layer by pulling down the substrate for the purpose of forming a charge transfer layer (CTL) by coating application and immersing the substrate into a immersion liquid and coating the outside surface of the substrate with the immersion liquid while maintaining the immersion liquid level nearly at a prescribed height by allowing the immersion liquid to flow over the upper part when pulling up the substrate. The amount of supply of the immersion liquid is changed and at immersion of the substrate, the relative speed of the substrate and the immersion liquid is regulated to a range from 5.0 to 50.0 mm/sec and when pulling up the substrate, the velocity of flow of the flowing over immersion liquid is regulated to a range from 10.0 to 20.0 mm/sec. COPYRIGHT: (C)2005,JPO&NCIPI |
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fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2005092052A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2005092052A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2005092052A3</originalsourceid><addsrcrecordid>eNrjZAjwdQ3x8HdRcPMPUvB19At1c3QOCQ3y9HNXcPVxdQ4J8g_w8A_xdw9yDPDwdFYAc4JcnV0DgJSCo5-LQoiHK6ooDwNrWmJOcSovlOZmUHJzDXH20E0tyI9PLS5ITE7NSy2J9wowMjAwNbA0MjA1cjQmShEAJI8wHw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>METHOD FOR MANUFACTURING ELECTROPHOTOGRAPHIC PHOTORECEPTOR AND THE PHOTORECEPTOR</title><source>esp@cenet</source><creator>MORITA TATSUHIRO ; TAKANO KATSUYA ; MIMURA SHINYA</creator><creatorcontrib>MORITA TATSUHIRO ; TAKANO KATSUYA ; MIMURA SHINYA</creatorcontrib><description>PROBLEM TO BE SOLVED: To provide a method for manufacturing an electrophotographic photoreceptor capable of efficiently forming an excellent photosensitive layer free of coating application unevenness on a substrate even when a wiping off treatment and a drying process are not carried out after immersion coating application of a charge generating layer (CGL) and the photoreceptor. SOLUTION: The method for manufacturing the electrophotographic photoreceptor comprises forming the photosensitive layer by pulling down the substrate for the purpose of forming a charge transfer layer (CTL) by coating application and immersing the substrate into a immersion liquid and coating the outside surface of the substrate with the immersion liquid while maintaining the immersion liquid level nearly at a prescribed height by allowing the immersion liquid to flow over the upper part when pulling up the substrate. The amount of supply of the immersion liquid is changed and at immersion of the substrate, the relative speed of the substrate and the immersion liquid is regulated to a range from 5.0 to 50.0 mm/sec and when pulling up the substrate, the velocity of flow of the flowing over immersion liquid is regulated to a range from 10.0 to 20.0 mm/sec. COPYRIGHT: (C)2005,JPO&NCIPI</description><edition>7</edition><language>eng</language><subject>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ; CINEMATOGRAPHY ; ELECTROGRAPHY ; ELECTROPHOTOGRAPHY ; HOLOGRAPHY ; MAGNETOGRAPHY ; PERFORMING OPERATIONS ; PHOTOGRAPHY ; PHYSICS ; PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL ; SPRAYING OR ATOMISING IN GENERAL ; TRANSPORTING</subject><creationdate>2005</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20050407&DB=EPODOC&CC=JP&NR=2005092052A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20050407&DB=EPODOC&CC=JP&NR=2005092052A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MORITA TATSUHIRO</creatorcontrib><creatorcontrib>TAKANO KATSUYA</creatorcontrib><creatorcontrib>MIMURA SHINYA</creatorcontrib><title>METHOD FOR MANUFACTURING ELECTROPHOTOGRAPHIC PHOTORECEPTOR AND THE PHOTORECEPTOR</title><description>PROBLEM TO BE SOLVED: To provide a method for manufacturing an electrophotographic photoreceptor capable of efficiently forming an excellent photosensitive layer free of coating application unevenness on a substrate even when a wiping off treatment and a drying process are not carried out after immersion coating application of a charge generating layer (CGL) and the photoreceptor. SOLUTION: The method for manufacturing the electrophotographic photoreceptor comprises forming the photosensitive layer by pulling down the substrate for the purpose of forming a charge transfer layer (CTL) by coating application and immersing the substrate into a immersion liquid and coating the outside surface of the substrate with the immersion liquid while maintaining the immersion liquid level nearly at a prescribed height by allowing the immersion liquid to flow over the upper part when pulling up the substrate. The amount of supply of the immersion liquid is changed and at immersion of the substrate, the relative speed of the substrate and the immersion liquid is regulated to a range from 5.0 to 50.0 mm/sec and when pulling up the substrate, the velocity of flow of the flowing over immersion liquid is regulated to a range from 10.0 to 20.0 mm/sec. COPYRIGHT: (C)2005,JPO&NCIPI</description><subject>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>ELECTROPHOTOGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MAGNETOGRAPHY</subject><subject>PERFORMING OPERATIONS</subject><subject>PHOTOGRAPHY</subject><subject>PHYSICS</subject><subject>PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL</subject><subject>SPRAYING OR ATOMISING IN GENERAL</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2005</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZAjwdQ3x8HdRcPMPUvB19At1c3QOCQ3y9HNXcPVxdQ4J8g_w8A_xdw9yDPDwdFYAc4JcnV0DgJSCo5-LQoiHK6ooDwNrWmJOcSovlOZmUHJzDXH20E0tyI9PLS5ITE7NSy2J9wowMjAwNbA0MjA1cjQmShEAJI8wHw</recordid><startdate>20050407</startdate><enddate>20050407</enddate><creator>MORITA TATSUHIRO</creator><creator>TAKANO KATSUYA</creator><creator>MIMURA SHINYA</creator><scope>EVB</scope></search><sort><creationdate>20050407</creationdate><title>METHOD FOR MANUFACTURING ELECTROPHOTOGRAPHIC PHOTORECEPTOR AND THE PHOTORECEPTOR</title><author>MORITA TATSUHIRO ; TAKANO KATSUYA ; MIMURA SHINYA</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2005092052A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2005</creationdate><topic>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>ELECTROPHOTOGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MAGNETOGRAPHY</topic><topic>PERFORMING OPERATIONS</topic><topic>PHOTOGRAPHY</topic><topic>PHYSICS</topic><topic>PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL</topic><topic>SPRAYING OR ATOMISING IN GENERAL</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>MORITA TATSUHIRO</creatorcontrib><creatorcontrib>TAKANO KATSUYA</creatorcontrib><creatorcontrib>MIMURA SHINYA</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MORITA TATSUHIRO</au><au>TAKANO KATSUYA</au><au>MIMURA SHINYA</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>METHOD FOR MANUFACTURING ELECTROPHOTOGRAPHIC PHOTORECEPTOR AND THE PHOTORECEPTOR</title><date>2005-04-07</date><risdate>2005</risdate><abstract>PROBLEM TO BE SOLVED: To provide a method for manufacturing an electrophotographic photoreceptor capable of efficiently forming an excellent photosensitive layer free of coating application unevenness on a substrate even when a wiping off treatment and a drying process are not carried out after immersion coating application of a charge generating layer (CGL) and the photoreceptor. SOLUTION: The method for manufacturing the electrophotographic photoreceptor comprises forming the photosensitive layer by pulling down the substrate for the purpose of forming a charge transfer layer (CTL) by coating application and immersing the substrate into a immersion liquid and coating the outside surface of the substrate with the immersion liquid while maintaining the immersion liquid level nearly at a prescribed height by allowing the immersion liquid to flow over the upper part when pulling up the substrate. The amount of supply of the immersion liquid is changed and at immersion of the substrate, the relative speed of the substrate and the immersion liquid is regulated to a range from 5.0 to 50.0 mm/sec and when pulling up the substrate, the velocity of flow of the flowing over immersion liquid is regulated to a range from 10.0 to 20.0 mm/sec. COPYRIGHT: (C)2005,JPO&NCIPI</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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subjects | APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL CINEMATOGRAPHY ELECTROGRAPHY ELECTROPHOTOGRAPHY HOLOGRAPHY MAGNETOGRAPHY PERFORMING OPERATIONS PHOTOGRAPHY PHYSICS PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL SPRAYING OR ATOMISING IN GENERAL TRANSPORTING |
title | METHOD FOR MANUFACTURING ELECTROPHOTOGRAPHIC PHOTORECEPTOR AND THE PHOTORECEPTOR |
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