GRINDING SHEET
PROBLEM TO BE SOLVED: To provide a grinding sheet which achieves high evenness and precise surface profile of a workpiece. SOLUTION: The grinding sheet is formed of a base material and a porous layer having continuous pores, which is attached to, embedded in, or laminated on at least part of the bas...
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| creator | MURATA MOICHI KATAYAMA KOJI |
| description | PROBLEM TO BE SOLVED: To provide a grinding sheet which achieves high evenness and precise surface profile of a workpiece. SOLUTION: The grinding sheet is formed of a base material and a porous layer having continuous pores, which is attached to, embedded in, or laminated on at least part of the base material. The porous layer is made of a polar solvent soluble polymeric material having a gel point of 6 or more, and a mean pore size is 30 μm or less. COPYRIGHT: (C)2005,JPO&NCIPI |
| format | Patent |
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COPYRIGHT: (C)2005,JPO&NCIPI</description><edition>7</edition><language>eng</language><subject>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G ; BASIC ELECTRIC ELEMENTS ; CHEMISTRY ; COMPOSITIONS BASED THEREON ; DRESSING OR CONDITIONING OF ABRADING SURFACES ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS ; GENERAL PROCESSES OF COMPOUNDING ; GRINDING ; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING ; METALLURGY ; ORGANIC MACROMOLECULAR COMPOUNDS ; PERFORMING OPERATIONS ; POLISHING ; SEMICONDUCTOR DEVICES ; THEIR PREPARATION OR CHEMICAL WORKING-UP ; TRANSPORTING ; WORKING-UP</subject><creationdate>2005</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20050210&DB=EPODOC&CC=JP&NR=2005034971A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76516</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20050210&DB=EPODOC&CC=JP&NR=2005034971A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MURATA MOICHI</creatorcontrib><creatorcontrib>KATAYAMA KOJI</creatorcontrib><title>GRINDING SHEET</title><description>PROBLEM TO BE SOLVED: To provide a grinding sheet which achieves high evenness and precise surface profile of a workpiece. 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SOLUTION: The grinding sheet is formed of a base material and a porous layer having continuous pores, which is attached to, embedded in, or laminated on at least part of the base material. The porous layer is made of a polar solvent soluble polymeric material having a gel point of 6 or more, and a mean pore size is 30 μm or less. COPYRIGHT: (C)2005,JPO&NCIPI</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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| language | eng |
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| subjects | AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G BASIC ELECTRIC ELEMENTS CHEMISTRY COMPOSITIONS BASED THEREON DRESSING OR CONDITIONING OF ABRADING SURFACES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GENERAL PROCESSES OF COMPOUNDING GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS PERFORMING OPERATIONS POLISHING SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP TRANSPORTING WORKING-UP |
| title | GRINDING SHEET |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-13T23%3A52%3A34IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=MURATA%20MOICHI&rft.date=2005-02-10&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJP2005034971A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |