CORRECTION OF PATTERN IMAGE IN IMAGING PROCESS

PROBLEM TO BE SOLVED: To provide a method of correcting the distortion of a pattern image projected in an imaging process and decreasing an overlay error, when the pattern is overlaid on a substrate by a lithography projection apparatus. SOLUTION: The pattern is arranged on a mask, and the image is...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	LEENARDUS HENRICUS MARIE VERSTAPPEN, JEUNINK ANDRE BERNARDUS, TEL WIM TJIBBE, VAN DER HOFF ALEXANDER HENDRIKUS MARTINUS, FINDERS JOSEF MARIA
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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