PHOTORESIST REMOVER AND VAMP FORMING METHOD FOR SEMICONDUCTOR DEVICE USING THE SAME

PROBLEM TO BE SOLVED: To provide a photoresist remover and a vamp forming method for a semiconductor device using the same in which a photoresist can be effectively removed by a simple process. SOLUTION: A protecting film pattern is formed with an opening for partially exposing an upper part of a me...

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Hauptverfasser:	TO JINKAI, BOKU TOCHIN, JUN PIL-KWON, CHON SANG-MOON
Format:	Patent
Sprache:	eng
Schlagworte:	ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CANDLES CHEMISTRY CINEMATOGRAPHY DETERGENT COMPOSITIONS DETERGENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY FATTY ACIDS THEREFROM HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS RECOVERY OF GLYCEROL RESIN SOAPS SEMICONDUCTOR DEVICES SOAP OR SOAP-MAKING USE OF SINGLE SUBSTANCES AS DETERGENTS
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Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a photoresist remover and a vamp forming method for a semiconductor device using the same in which a photoresist can be effectively removed by a simple process. SOLUTION: A protecting film pattern is formed with an opening for partially exposing an upper part of a metal wiring pattern on a substrate with the metal wiring pattern formed thereon. The photoresist having a vamp opening is patterned on the protecting film pattern and a metal is grown in the vamp opening to form the vamp. The photo-resist pattern is then removed by the photoresist remover containing, as main components, monoethanolamine and dimethylacetamide. Thus, the photoresist pattern can be efficiently and perfectly removed. COPYRIGHT: (C)2005,JPO&NCIPI