WAFER CARRYING APPARATUS

PROBLEM TO BE SOLVED: To provide a wafer carrying apparatus by decreasing the velocity of a flow of an air stream leaked from a gap of a base of an ascending/descending machine so as to suppress the disturbance of the air stream, thereby maintaining a high degree of cleanliness. SOLUTION: The wafer...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: AOKI TAKASHI, MIYAGAWA HIDEKAZU
Format: Patent
Sprache:eng
Schlagworte:
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