FILM FORMATION METHOD, OPTICAL ELEMENT, SEMICONDUCTOR ELEMENT AND ELECTRONIC EQUIPMENT, MANUFACTURING METHOD OF ELECTRO-OPTICAL DEVICE, AND MANUFACTURING METHOD OF COLOR FILTER
PROBLEM TO BE SOLVED: To provide a film formation method which enables reduction of the manufacturing cost and time in film formation, by applying a liquid material to the entire desired pattern region and to provide an optical element, a semiconductor element, and electronic equipment. SOLUTION: In...
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creator | ASUKE SHINTARO MIYAGAWA TAKUYA SOGO TOMOHIKO |
description | PROBLEM TO BE SOLVED: To provide a film formation method which enables reduction of the manufacturing cost and time in film formation, by applying a liquid material to the entire desired pattern region and to provide an optical element, a semiconductor element, and electronic equipment. SOLUTION: In the film formation method, a patterning region is divided by forming a partition 11 in a treatment surface of a substrate 10, and a desired film is provided to the patterning region, having a process for filling an inner region of the partition 11 with the liquid material. In the method, a film 12 formed of desired solvent is formed in the inner region of the partition 11, prior to the process for filling it with the liquid material. COPYRIGHT: (C)2004,JPO |
format | Patent |
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subjects | BASIC ELECTRIC ELEMENTS ELECTRIC HEATING ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHYSICS SEMICONDUCTOR DEVICES |
title | FILM FORMATION METHOD, OPTICAL ELEMENT, SEMICONDUCTOR ELEMENT AND ELECTRONIC EQUIPMENT, MANUFACTURING METHOD OF ELECTRO-OPTICAL DEVICE, AND MANUFACTURING METHOD OF COLOR FILTER |
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