INSPECTION APPARATUS AND INSPECTION METHOD

PROBLEM TO BE SOLVED: To provide an inspection apparatus and an inspection method for making inspection by irradiating a sample with an electron beam, by which image formation is achieved with good quality without need of any complicated optical system, and throughput of inspection can be improved....

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SATAKE TORU, NOMICHI SHINJI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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