BINDER FOR RESIST, AND RESIST USING THE SAME

PROBLEM TO BE SOLVED: To provide a binder for a resist curable with low energy in a short time and excellent in pattern forming ability (developability) and to provide a resist. SOLUTION: The binder comprises a polymer (A1) whose weight average molecular weight (Mw) (expressed in terms of polystyren...

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Bibliographische Detailangaben
Hauptverfasser:	ITO HIROMITSU, MAYANAGI TOMOYUKI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a binder for a resist curable with low energy in a short time and excellent in pattern forming ability (developability) and to provide a resist. SOLUTION: The binder comprises a polymer (A1) whose weight average molecular weight (Mw) (expressed in terms of polystyrene) is 5,000-30,000 and a polymer (A2) whose Mw is 60,000-150,000. The resist comprises the binder, a colorant and a photopolymerization initiator. COPYRIGHT: (C)2003,JPO