APPARATUS AND METHOD FOR FEEDING LIQUID SOURCE MATERIAL
PROBLEM TO BE SOLVED: To provide an apparatus and a method for feeding a liquid source material capable of easily feeding a CVD liquid source material to a vaporizing/ feeding apparatus without discontinuing feeding of the vaporized CVD liquid source material to a CVD apparatus in feeding the vapori...
Gespeichert in:
| Hauptverfasser: | , |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | YONEYAMA GAKUO TAKAMATSU YUKICHI |
| description | PROBLEM TO BE SOLVED: To provide an apparatus and a method for feeding a liquid source material capable of easily feeding a CVD liquid source material to a vaporizing/ feeding apparatus without discontinuing feeding of the vaporized CVD liquid source material to a CVD apparatus in feeding the vaporized CVD liquid source material. SOLUTION: This apparatus for feeding a liquid source material is a portable liquid-source-material feeding apparatus, which comprises a CVD liquid-source- material container and a cleaning-liquid container. The CVD liquid-source- material container is provided with a heating means, a CVD liquid-source- material feeding tube for feeding the CVD liquid source material to the outside, and an inlet tube for compressed gas for transportation. The cleaning-liquid container is provided with a cleaning-liquid feeding tube for feeding the cleaning liquid to the CVD liquid-source-material feeding tube and an inlet tube for compressed gas for transportation. Besides, to the CVD liquid-source-material feeding tube, a discharge tube for discharging residual cleaning liquid to the outside is connected. The CVD liquid source material is fed to the vaporizing/ feeding apparatus by using the portable liquid-source-material feeding apparatus. COPYRIGHT: (C)2003,JPO |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2003168651A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2003168651A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2003168651A3</originalsourceid><addsrcrecordid>eNrjZDB3DAhwDHIMCQ1WcPRzUfB1DfHwd1Fw8w9ScHN1dfH0c1fw8QwM9XRRCPYPDXJ2VfB1DHEN8nT04WFgTUvMKU7lhdLcDEpuriHOHrqpBfnxqcUFicmpeakl8V4BRgYGxoZmFmamho7GRCkCAHa8KHg</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>APPARATUS AND METHOD FOR FEEDING LIQUID SOURCE MATERIAL</title><source>esp@cenet</source><creator>YONEYAMA GAKUO ; TAKAMATSU YUKICHI</creator><creatorcontrib>YONEYAMA GAKUO ; TAKAMATSU YUKICHI</creatorcontrib><description>PROBLEM TO BE SOLVED: To provide an apparatus and a method for feeding a liquid source material capable of easily feeding a CVD liquid source material to a vaporizing/ feeding apparatus without discontinuing feeding of the vaporized CVD liquid source material to a CVD apparatus in feeding the vaporized CVD liquid source material. SOLUTION: This apparatus for feeding a liquid source material is a portable liquid-source-material feeding apparatus, which comprises a CVD liquid-source- material container and a cleaning-liquid container. The CVD liquid-source- material container is provided with a heating means, a CVD liquid-source- material feeding tube for feeding the CVD liquid source material to the outside, and an inlet tube for compressed gas for transportation. The cleaning-liquid container is provided with a cleaning-liquid feeding tube for feeding the cleaning liquid to the CVD liquid-source-material feeding tube and an inlet tube for compressed gas for transportation. Besides, to the CVD liquid-source-material feeding tube, a discharge tube for discharging residual cleaning liquid to the outside is connected. The CVD liquid source material is fed to the vaporizing/ feeding apparatus by using the portable liquid-source-material feeding apparatus. COPYRIGHT: (C)2003,JPO</description><edition>7</edition><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SEMICONDUCTOR DEVICES ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2003</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20030613&DB=EPODOC&CC=JP&NR=2003168651A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20030613&DB=EPODOC&CC=JP&NR=2003168651A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>YONEYAMA GAKUO</creatorcontrib><creatorcontrib>TAKAMATSU YUKICHI</creatorcontrib><title>APPARATUS AND METHOD FOR FEEDING LIQUID SOURCE MATERIAL</title><description>PROBLEM TO BE SOLVED: To provide an apparatus and a method for feeding a liquid source material capable of easily feeding a CVD liquid source material to a vaporizing/ feeding apparatus without discontinuing feeding of the vaporized CVD liquid source material to a CVD apparatus in feeding the vaporized CVD liquid source material. SOLUTION: This apparatus for feeding a liquid source material is a portable liquid-source-material feeding apparatus, which comprises a CVD liquid-source- material container and a cleaning-liquid container. The CVD liquid-source- material container is provided with a heating means, a CVD liquid-source- material feeding tube for feeding the CVD liquid source material to the outside, and an inlet tube for compressed gas for transportation. The cleaning-liquid container is provided with a cleaning-liquid feeding tube for feeding the cleaning liquid to the CVD liquid-source-material feeding tube and an inlet tube for compressed gas for transportation. Besides, to the CVD liquid-source-material feeding tube, a discharge tube for discharging residual cleaning liquid to the outside is connected. The CVD liquid source material is fed to the vaporizing/ feeding apparatus by using the portable liquid-source-material feeding apparatus. COPYRIGHT: (C)2003,JPO</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2003</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDB3DAhwDHIMCQ1WcPRzUfB1DfHwd1Fw8w9ScHN1dfH0c1fw8QwM9XRRCPYPDXJ2VfB1DHEN8nT04WFgTUvMKU7lhdLcDEpuriHOHrqpBfnxqcUFicmpeakl8V4BRgYGxoZmFmamho7GRCkCAHa8KHg</recordid><startdate>20030613</startdate><enddate>20030613</enddate><creator>YONEYAMA GAKUO</creator><creator>TAKAMATSU YUKICHI</creator><scope>EVB</scope></search><sort><creationdate>20030613</creationdate><title>APPARATUS AND METHOD FOR FEEDING LIQUID SOURCE MATERIAL</title><author>YONEYAMA GAKUO ; TAKAMATSU YUKICHI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2003168651A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2003</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>YONEYAMA GAKUO</creatorcontrib><creatorcontrib>TAKAMATSU YUKICHI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>YONEYAMA GAKUO</au><au>TAKAMATSU YUKICHI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>APPARATUS AND METHOD FOR FEEDING LIQUID SOURCE MATERIAL</title><date>2003-06-13</date><risdate>2003</risdate><abstract>PROBLEM TO BE SOLVED: To provide an apparatus and a method for feeding a liquid source material capable of easily feeding a CVD liquid source material to a vaporizing/ feeding apparatus without discontinuing feeding of the vaporized CVD liquid source material to a CVD apparatus in feeding the vaporized CVD liquid source material. SOLUTION: This apparatus for feeding a liquid source material is a portable liquid-source-material feeding apparatus, which comprises a CVD liquid-source- material container and a cleaning-liquid container. The CVD liquid-source- material container is provided with a heating means, a CVD liquid-source- material feeding tube for feeding the CVD liquid source material to the outside, and an inlet tube for compressed gas for transportation. The cleaning-liquid container is provided with a cleaning-liquid feeding tube for feeding the cleaning liquid to the CVD liquid-source-material feeding tube and an inlet tube for compressed gas for transportation. Besides, to the CVD liquid-source-material feeding tube, a discharge tube for discharging residual cleaning liquid to the outside is connected. The CVD liquid source material is fed to the vaporizing/ feeding apparatus by using the portable liquid-source-material feeding apparatus. COPYRIGHT: (C)2003,JPO</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng |
| recordid | cdi_epo_espacenet_JP2003168651A |
| source | esp@cenet |
| subjects | BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | APPARATUS AND METHOD FOR FEEDING LIQUID SOURCE MATERIAL |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-02T20%3A28%3A52IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=YONEYAMA%20GAKUO&rft.date=2003-06-13&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJP2003168651A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |