POINT DIFFRACTION INTERFEROMETER
PROBLEM TO BE SOLVED: To provide a point diffraction interferometer enabling development of relatively high-intensity radiation, utilization of an interferometer analysis, and also use of an extended source emitting spatially-incoherent radiation. SOLUTION: The point diffraction interferometer is pr...
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| creator | VISSER HUGO MATTHIEU |
| description | PROBLEM TO BE SOLVED: To provide a point diffraction interferometer enabling development of relatively high-intensity radiation, utilization of an interferometer analysis, and also use of an extended source emitting spatially-incoherent radiation. SOLUTION: The point diffraction interferometer is provided with an electromagnetic radiation source 1, a perforated mask 2 on its inlet end, an optical testing space 4 through which an optical system to be tested 9 can be inserted, means (5, 6) for generating a test beam and a reference beam by using a perforated mask 6 on its outlet end, and means (7, 8) for analyzing an interference pattern 16 generated by overlapping the test beam and the reference beam each other. A nearly-punctate through hole on an one- or two-dimensional array (12, 15) is incorporated into the perforated masks (2, 6) on both the inlet and outlet ends of the interferometer. One of its applications is, for example, a test optical system used for a photoengraving exposure system. COPYRIGHT: (C)2003,JPO |
| format | Patent |
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SOLUTION: The point diffraction interferometer is provided with an electromagnetic radiation source 1, a perforated mask 2 on its inlet end, an optical testing space 4 through which an optical system to be tested 9 can be inserted, means (5, 6) for generating a test beam and a reference beam by using a perforated mask 6 on its outlet end, and means (7, 8) for analyzing an interference pattern 16 generated by overlapping the test beam and the reference beam each other. A nearly-punctate through hole on an one- or two-dimensional array (12, 15) is incorporated into the perforated masks (2, 6) on both the inlet and outlet ends of the interferometer. One of its applications is, for example, a test optical system used for a photoengraving exposure system. 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SOLUTION: The point diffraction interferometer is provided with an electromagnetic radiation source 1, a perforated mask 2 on its inlet end, an optical testing space 4 through which an optical system to be tested 9 can be inserted, means (5, 6) for generating a test beam and a reference beam by using a perforated mask 6 on its outlet end, and means (7, 8) for analyzing an interference pattern 16 generated by overlapping the test beam and the reference beam each other. A nearly-punctate through hole on an one- or two-dimensional array (12, 15) is incorporated into the perforated masks (2, 6) on both the inlet and outlet ends of the interferometer. One of its applications is, for example, a test optical system used for a photoengraving exposure system. 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SOLUTION: The point diffraction interferometer is provided with an electromagnetic radiation source 1, a perforated mask 2 on its inlet end, an optical testing space 4 through which an optical system to be tested 9 can be inserted, means (5, 6) for generating a test beam and a reference beam by using a perforated mask 6 on its outlet end, and means (7, 8) for analyzing an interference pattern 16 generated by overlapping the test beam and the reference beam each other. A nearly-punctate through hole on an one- or two-dimensional array (12, 15) is incorporated into the perforated masks (2, 6) on both the inlet and outlet ends of the interferometer. One of its applications is, for example, a test optical system used for a photoengraving exposure system. COPYRIGHT: (C)2003,JPO</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TESTING TESTING STATIC OR DYNAMIC BALANCE OF MACHINES ORSTRUCTURES TESTING STRUCTURES OR APPARATUS NOT OTHERWISE PROVIDED FOR |
| title | POINT DIFFRACTION INTERFEROMETER |
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