INORGANIC COATING FILM, AND ITS PRODUCTION METHOD
PROBLEM TO BE SOLVED: To provide a new inorganic coating film which contains the group 4A element, oxygen and boron, and to provide a method of producing an inorganic coating film by which a dense film is easily formed. SOLUTION: The inorganic coating film is formed on a substrate. The film consists...
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| creator | TAMURA HIDEKI MIZUSAKO FUMIKI |
| description | PROBLEM TO BE SOLVED: To provide a new inorganic coating film which contains the group 4A element, oxygen and boron, and to provide a method of producing an inorganic coating film by which a dense film is easily formed. SOLUTION: The inorganic coating film is formed on a substrate. The film consists of one layer or plural layers, and each layer contains the group 4A element, oxygen, and boron. Preferably, the group 4A element is titanium or zirconium, and the base material consists of metal, ceramics, or plastics. In the method of producing the inorganic coating film, a current is made to flow through a sample containing the group 4A element and oxygen, and the sample is explosively thermal-sprayed to form a film of one layer or plural layers on the base material. |
| format | Patent |
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SOLUTION: The inorganic coating film is formed on a substrate. The film consists of one layer or plural layers, and each layer contains the group 4A element, oxygen, and boron. Preferably, the group 4A element is titanium or zirconium, and the base material consists of metal, ceramics, or plastics. In the method of producing the inorganic coating film, a current is made to flow through a sample containing the group 4A element and oxygen, and the sample is explosively thermal-sprayed to form a film of one layer or plural layers on the base material.</description><edition>7</edition><language>eng</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2003</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20030521&DB=EPODOC&CC=JP&NR=2003147504A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76516</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20030521&DB=EPODOC&CC=JP&NR=2003147504A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>TAMURA HIDEKI</creatorcontrib><creatorcontrib>MIZUSAKO FUMIKI</creatorcontrib><title>INORGANIC COATING FILM, AND ITS PRODUCTION METHOD</title><description>PROBLEM TO BE SOLVED: To provide a new inorganic coating film which contains the group 4A element, oxygen and boron, and to provide a method of producing an inorganic coating film by which a dense film is easily formed. 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SOLUTION: The inorganic coating film is formed on a substrate. The film consists of one layer or plural layers, and each layer contains the group 4A element, oxygen, and boron. Preferably, the group 4A element is titanium or zirconium, and the base material consists of metal, ceramics, or plastics. In the method of producing the inorganic coating film, a current is made to flow through a sample containing the group 4A element and oxygen, and the sample is explosively thermal-sprayed to form a film of one layer or plural layers on the base material.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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| subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | INORGANIC COATING FILM, AND ITS PRODUCTION METHOD |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-15T18%3A54%3A54IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=TAMURA%20HIDEKI&rft.date=2003-05-21&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJP2003147504A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |