SUBSTRATE TREATMENT APPARATUS
PROBLEM TO BE SOLVED: To provide a substrate treatment apparatus that can prevent a substrate from being contaminated with impurities. SOLUTION: The substrate treatment apparatus comprises treatment sections G3 to G5 that have retention bodies 37 for retaining a wafer W to carry out prescribed treat...
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| creator | KITANO JUNICHI KATANO TAKAYUKI |
| description | PROBLEM TO BE SOLVED: To provide a substrate treatment apparatus that can prevent a substrate from being contaminated with impurities. SOLUTION: The substrate treatment apparatus comprises treatment sections G3 to G5 that have retention bodies 37 for retaining a wafer W to carry out prescribed treatment, a portable box 20 that has an opening where the retention body 37 can be loaded and unloaded and can form a closed space for accommodating the wafer W, and a conveyance mechanism for carrying the box 20 into and out of the treatment sections G1 to G5. In this manner, when the wafer W is conveyed, the wafer W is accommodated in the accommodation box 20. Additionally, when the prescribed treatment is made at the treatment sections G1 to G5, the wafer W may not be carried out of the box 20, and the adhesion of impurities such as oxygen and moisture in the atmosphere to the wafer W can be prevented. |
| format | Patent |
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SOLUTION: The substrate treatment apparatus comprises treatment sections G3 to G5 that have retention bodies 37 for retaining a wafer W to carry out prescribed treatment, a portable box 20 that has an opening where the retention body 37 can be loaded and unloaded and can form a closed space for accommodating the wafer W, and a conveyance mechanism for carrying the box 20 into and out of the treatment sections G1 to G5. In this manner, when the wafer W is conveyed, the wafer W is accommodated in the accommodation box 20. Additionally, when the prescribed treatment is made at the treatment sections G1 to G5, the wafer W may not be carried out of the box 20, and the adhesion of impurities such as oxygen and moisture in the atmosphere to the wafer W can be prevented.</description><edition>7</edition><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; CONVEYING ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; HANDLING THIN OR FILAMENTARY MATERIAL ; PACKING ; PERFORMING OPERATIONS ; PNEUMATIC TUBE CONVEYORS ; SEMICONDUCTOR DEVICES ; SHOP CONVEYOR SYSTEMS ; STORING ; TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING ORTIPPING ; TRANSPORTING</subject><creationdate>2003</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20030516&DB=EPODOC&CC=JP&NR=2003142552A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20030516&DB=EPODOC&CC=JP&NR=2003142552A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KITANO JUNICHI</creatorcontrib><creatorcontrib>KATANO TAKAYUKI</creatorcontrib><title>SUBSTRATE TREATMENT APPARATUS</title><description>PROBLEM TO BE SOLVED: To provide a substrate treatment apparatus that can prevent a substrate from being contaminated with impurities. 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Additionally, when the prescribed treatment is made at the treatment sections G1 to G5, the wafer W may not be carried out of the box 20, and the adhesion of impurities such as oxygen and moisture in the atmosphere to the wafer W can be prevented.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CONVEYING</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>HANDLING THIN OR FILAMENTARY MATERIAL</subject><subject>PACKING</subject><subject>PERFORMING OPERATIONS</subject><subject>PNEUMATIC TUBE CONVEYORS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SHOP CONVEYOR SYSTEMS</subject><subject>STORING</subject><subject>TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING ORTIPPING</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2003</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJANDnUKDglyDHFVCAlydQzxdfULUXAMCHAECoUG8zCwpiXmFKfyQmluBiU31xBnD93Ugvz41OKCxOTUvNSSeK8AIwMDY0MTI1NTI0djohQBAPWIIco</recordid><startdate>20030516</startdate><enddate>20030516</enddate><creator>KITANO JUNICHI</creator><creator>KATANO TAKAYUKI</creator><scope>EVB</scope></search><sort><creationdate>20030516</creationdate><title>SUBSTRATE TREATMENT APPARATUS</title><author>KITANO JUNICHI ; KATANO TAKAYUKI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2003142552A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2003</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CONVEYING</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>HANDLING THIN OR FILAMENTARY MATERIAL</topic><topic>PACKING</topic><topic>PERFORMING OPERATIONS</topic><topic>PNEUMATIC TUBE CONVEYORS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SHOP CONVEYOR SYSTEMS</topic><topic>STORING</topic><topic>TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING ORTIPPING</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>KITANO JUNICHI</creatorcontrib><creatorcontrib>KATANO TAKAYUKI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KITANO JUNICHI</au><au>KATANO TAKAYUKI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>SUBSTRATE TREATMENT APPARATUS</title><date>2003-05-16</date><risdate>2003</risdate><abstract>PROBLEM TO BE SOLVED: To provide a substrate treatment apparatus that can prevent a substrate from being contaminated with impurities. SOLUTION: The substrate treatment apparatus comprises treatment sections G3 to G5 that have retention bodies 37 for retaining a wafer W to carry out prescribed treatment, a portable box 20 that has an opening where the retention body 37 can be loaded and unloaded and can form a closed space for accommodating the wafer W, and a conveyance mechanism for carrying the box 20 into and out of the treatment sections G1 to G5. In this manner, when the wafer W is conveyed, the wafer W is accommodated in the accommodation box 20. Additionally, when the prescribed treatment is made at the treatment sections G1 to G5, the wafer W may not be carried out of the box 20, and the adhesion of impurities such as oxygen and moisture in the atmosphere to the wafer W can be prevented.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS CONVEYING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY HANDLING THIN OR FILAMENTARY MATERIAL PACKING PERFORMING OPERATIONS PNEUMATIC TUBE CONVEYORS SEMICONDUCTOR DEVICES SHOP CONVEYOR SYSTEMS STORING TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING ORTIPPING TRANSPORTING |
| title | SUBSTRATE TREATMENT APPARATUS |
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