MANUFACTURING METHOD FOR ACTIVE MATRIX SUBSTRATE
PROBLEM TO BE SOLVED: To provide a manufacturing method for forming a plurality of contact holes having depths different from each other efficiently and with good reproducibility. SOLUTION: The contact holes having depths different from each other are simultaneously formed by etching utilizing the d...
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| creator | OKA HITOSHI ISHIKAWA TORU IWASAKI KATSUO |
| description | PROBLEM TO BE SOLVED: To provide a manufacturing method for forming a plurality of contact holes having depths different from each other efficiently and with good reproducibility. SOLUTION: The contact holes having depths different from each other are simultaneously formed by etching utilizing the differences between etching speeds of insulating films 3 and 5 to be etched films and base conductive body films 2 and 4 of the contact holes, respectively. |
| format | Patent |
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| subjects | DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING FREQUENCY-CHANGING NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS PHYSICS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF |
| title | MANUFACTURING METHOD FOR ACTIVE MATRIX SUBSTRATE |
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