FORMING METHOD OF BARRIER OF PLASMA DISPLAY PANEL
PROBLEM TO BE SOLVED: To form a barrier of desired line pattern without making defects at the vicinity of the end portion in forming a barrier by sandblast method. SOLUTION: In patterning the barrier material layer through a masking layer by sandblast process, the pattern in the vicinity of the end...
Gespeichert in:
1. Verfasser: | |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | |
---|---|
container_issue | |
container_start_page | |
container_title | |
container_volume | |
creator | NISHIMURA SUKEYUKI |
description | PROBLEM TO BE SOLVED: To form a barrier of desired line pattern without making defects at the vicinity of the end portion in forming a barrier by sandblast method. SOLUTION: In patterning the barrier material layer through a masking layer by sandblast process, the pattern in the vicinity of the end portion A in the masking layer 3 is made so that the masking layer 3 having an extended portion is put adjacent to the masking layer 3 having no extended portion and that the extended portion of that adjoining masking layer 3 is positioned on the extension line of the masking layer 3 having no extended portion. Since the flow of mixed air containing the grinding material is blocked at the extended portion, the barrier material layer in the vicinity of the end portion A of the masking layer 3 is not excessively ground, and the masking layer 3 is not removed from the end portion A during the course of the process. At the removal process of the masking layer 3 in the later process, the extended portion is removed simultaneously, and no extra time is necessary for removal. |
format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2003123636A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2003123636A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2003123636A3</originalsourceid><addsrcrecordid>eNrjZDB08w_y9fRzV_B1DfHwd1Hwd1NwcgwK8nQNAjEDfByDfR0VXDyDgaxIhQBHP1cfHgbWtMSc4lReKM3NoOTmGuLsoZtakB-fWlyQmJyal1oS7xVgZGBgbGhkbGZs5mhMlCIAfPImqA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>FORMING METHOD OF BARRIER OF PLASMA DISPLAY PANEL</title><source>esp@cenet</source><creator>NISHIMURA SUKEYUKI</creator><creatorcontrib>NISHIMURA SUKEYUKI</creatorcontrib><description>PROBLEM TO BE SOLVED: To form a barrier of desired line pattern without making defects at the vicinity of the end portion in forming a barrier by sandblast method. SOLUTION: In patterning the barrier material layer through a masking layer by sandblast process, the pattern in the vicinity of the end portion A in the masking layer 3 is made so that the masking layer 3 having an extended portion is put adjacent to the masking layer 3 having no extended portion and that the extended portion of that adjoining masking layer 3 is positioned on the extension line of the masking layer 3 having no extended portion. Since the flow of mixed air containing the grinding material is blocked at the extended portion, the barrier material layer in the vicinity of the end portion A of the masking layer 3 is not excessively ground, and the masking layer 3 is not removed from the end portion A during the course of the process. At the removal process of the masking layer 3 in the later process, the extended portion is removed simultaneously, and no extra time is necessary for removal.</description><edition>7</edition><language>eng</language><subject>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ; BASIC ELECTRIC ELEMENTS ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRICITY ; PERFORMING OPERATIONS ; PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL ; SPRAYING OR ATOMISING IN GENERAL ; TRANSPORTING</subject><creationdate>2003</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20030425&DB=EPODOC&CC=JP&NR=2003123636A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20030425&DB=EPODOC&CC=JP&NR=2003123636A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>NISHIMURA SUKEYUKI</creatorcontrib><title>FORMING METHOD OF BARRIER OF PLASMA DISPLAY PANEL</title><description>PROBLEM TO BE SOLVED: To form a barrier of desired line pattern without making defects at the vicinity of the end portion in forming a barrier by sandblast method. SOLUTION: In patterning the barrier material layer through a masking layer by sandblast process, the pattern in the vicinity of the end portion A in the masking layer 3 is made so that the masking layer 3 having an extended portion is put adjacent to the masking layer 3 having no extended portion and that the extended portion of that adjoining masking layer 3 is positioned on the extension line of the masking layer 3 having no extended portion. Since the flow of mixed air containing the grinding material is blocked at the extended portion, the barrier material layer in the vicinity of the end portion A of the masking layer 3 is not excessively ground, and the masking layer 3 is not removed from the end portion A during the course of the process. At the removal process of the masking layer 3 in the later process, the extended portion is removed simultaneously, and no extra time is necessary for removal.</description><subject>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRICITY</subject><subject>PERFORMING OPERATIONS</subject><subject>PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL</subject><subject>SPRAYING OR ATOMISING IN GENERAL</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2003</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDB08w_y9fRzV_B1DfHwd1Hwd1NwcgwK8nQNAjEDfByDfR0VXDyDgaxIhQBHP1cfHgbWtMSc4lReKM3NoOTmGuLsoZtakB-fWlyQmJyal1oS7xVgZGBgbGhkbGZs5mhMlCIAfPImqA</recordid><startdate>20030425</startdate><enddate>20030425</enddate><creator>NISHIMURA SUKEYUKI</creator><scope>EVB</scope></search><sort><creationdate>20030425</creationdate><title>FORMING METHOD OF BARRIER OF PLASMA DISPLAY PANEL</title><author>NISHIMURA SUKEYUKI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2003123636A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2003</creationdate><topic>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRICITY</topic><topic>PERFORMING OPERATIONS</topic><topic>PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL</topic><topic>SPRAYING OR ATOMISING IN GENERAL</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>NISHIMURA SUKEYUKI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>NISHIMURA SUKEYUKI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>FORMING METHOD OF BARRIER OF PLASMA DISPLAY PANEL</title><date>2003-04-25</date><risdate>2003</risdate><abstract>PROBLEM TO BE SOLVED: To form a barrier of desired line pattern without making defects at the vicinity of the end portion in forming a barrier by sandblast method. SOLUTION: In patterning the barrier material layer through a masking layer by sandblast process, the pattern in the vicinity of the end portion A in the masking layer 3 is made so that the masking layer 3 having an extended portion is put adjacent to the masking layer 3 having no extended portion and that the extended portion of that adjoining masking layer 3 is positioned on the extension line of the masking layer 3 having no extended portion. Since the flow of mixed air containing the grinding material is blocked at the extended portion, the barrier material layer in the vicinity of the end portion A of the masking layer 3 is not excessively ground, and the masking layer 3 is not removed from the end portion A during the course of the process. At the removal process of the masking layer 3 in the later process, the extended portion is removed simultaneously, and no extra time is necessary for removal.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | |
ispartof | |
issn | |
language | eng |
recordid | cdi_epo_espacenet_JP2003123636A |
source | esp@cenet |
subjects | APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY PERFORMING OPERATIONS PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL SPRAYING OR ATOMISING IN GENERAL TRANSPORTING |
title | FORMING METHOD OF BARRIER OF PLASMA DISPLAY PANEL |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-07T04%3A16%3A12IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=NISHIMURA%20SUKEYUKI&rft.date=2003-04-25&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJP2003123636A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |