METHOD OF FORMING RUGGEDNESS ON PHOTOSENSITIVE INSULATING FILM AND REFLECTION ELECTRODE AND METHOD OF MANUFACTURING LIQUID CRYSTAL DISPLAY HAVING RUGGED STRUCTURE REFLECTION ELECTRODE USING THE SAME
PROBLEM TO BE SOLVED: To provide a method of forming ruggedness on a photosensitive insulating film having uniform reflectivity and a reflection electrode and a method of manufacturing a liquid crystal display having the rugged structure reflection electrode. SOLUTION: An interval d2 between light s...
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| creator | CHO RYUKEI KIM JAE-HYUN |
| description | PROBLEM TO BE SOLVED: To provide a method of forming ruggedness on a photosensitive insulating film having uniform reflectivity and a reflection electrode and a method of manufacturing a liquid crystal display having the rugged structure reflection electrode. SOLUTION: An interval d2 between light shielding patterns 614 in a 1st part corresponding to the upper side of metal patterns 450, 450b, 470, 475 in light shielding patterns 612, 614 of a 2nd mask 610 containing light projecting regions 605, 614 transmitting incident light and the light shielding pattern 612, 614 reflecting incident light is made narrower by a prescribed ratio than an interval d1 between the light shielding patterns 612 corresponding to the upper side of a 2nd part where the metal pattern is absent. The photosensitive insulating film is exposed and developed to form ruggedness on the surface of the photosensitive insulating film. Dents or grooves have the same depth through the photosensitive insulating film and the reflection electrode formed thereon and the uniformity of the reflection efficiency is improved through the whole display region. |
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SOLUTION: An interval d2 between light shielding patterns 614 in a 1st part corresponding to the upper side of metal patterns 450, 450b, 470, 475 in light shielding patterns 612, 614 of a 2nd mask 610 containing light projecting regions 605, 614 transmitting incident light and the light shielding pattern 612, 614 reflecting incident light is made narrower by a prescribed ratio than an interval d1 between the light shielding patterns 612 corresponding to the upper side of a 2nd part where the metal pattern is absent. The photosensitive insulating film is exposed and developed to form ruggedness on the surface of the photosensitive insulating film. Dents or grooves have the same depth through the photosensitive insulating film and the reflection electrode formed thereon and the uniformity of the reflection efficiency is improved through the whole display region.</description><edition>7</edition><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ; ELECTROGRAPHY ; FREQUENCY-CHANGING ; HOLOGRAPHY ; MATERIALS THEREFOR ; NON-LINEAR OPTICS ; OPTICAL ANALOGUE/DIGITAL CONVERTERS ; OPTICAL LOGIC ELEMENTS ; OPTICS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF</subject><creationdate>2003</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20030305&DB=EPODOC&CC=JP&NR=2003066476A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20030305&DB=EPODOC&CC=JP&NR=2003066476A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>CHO RYUKEI</creatorcontrib><creatorcontrib>KIM JAE-HYUN</creatorcontrib><title>METHOD OF FORMING RUGGEDNESS ON PHOTOSENSITIVE INSULATING FILM AND REFLECTION ELECTRODE AND METHOD OF MANUFACTURING LIQUID CRYSTAL DISPLAY HAVING RUGGED STRUCTURE REFLECTION ELECTRODE USING THE SAME</title><description>PROBLEM TO BE SOLVED: To provide a method of forming ruggedness on a photosensitive insulating film having uniform reflectivity and a reflection electrode and a method of manufacturing a liquid crystal display having the rugged structure reflection electrode. 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Dents or grooves have the same depth through the photosensitive insulating film and the reflection electrode formed thereon and the uniformity of the reflection efficiency is improved through the whole display region.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING</subject><subject>ELECTROGRAPHY</subject><subject>FREQUENCY-CHANGING</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>NON-LINEAR OPTICS</subject><subject>OPTICAL ANALOGUE/DIGITAL CONVERTERS</subject><subject>OPTICAL LOGIC ELEMENTS</subject><subject>OPTICS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2003</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjc1KA0EQhPeSg0TfocldWIys52anZ6dlftbpnkBOIcjkJCaQPGOeS0eEXDx4qoL6ququuwZSlwwkCzblwHGCXKaJTCQRSBFmlzQJRWHlDQFHKR61cZZ9AIwGMllPo_I3Tc3kZOgnuG0HjMXiqCW3pue3wgbGvBVFD4Zl9rgFh5vbP4jm0gr0936RxqojEAx03y0O-49zffjVZbeypKN7rKfjrp5P-_f6WS-71_mp79f9MDy_DLj-F_QFhiVQWA</recordid><startdate>20030305</startdate><enddate>20030305</enddate><creator>CHO RYUKEI</creator><creator>KIM JAE-HYUN</creator><scope>EVB</scope></search><sort><creationdate>20030305</creationdate><title>METHOD OF FORMING RUGGEDNESS ON PHOTOSENSITIVE INSULATING FILM AND REFLECTION ELECTRODE AND METHOD OF MANUFACTURING LIQUID CRYSTAL DISPLAY HAVING RUGGED STRUCTURE REFLECTION ELECTRODE USING THE SAME</title><author>CHO RYUKEI ; KIM JAE-HYUN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2003066476A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2003</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING</topic><topic>ELECTROGRAPHY</topic><topic>FREQUENCY-CHANGING</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>NON-LINEAR OPTICS</topic><topic>OPTICAL ANALOGUE/DIGITAL CONVERTERS</topic><topic>OPTICAL LOGIC ELEMENTS</topic><topic>OPTICS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF</topic><toplevel>online_resources</toplevel><creatorcontrib>CHO RYUKEI</creatorcontrib><creatorcontrib>KIM JAE-HYUN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>CHO RYUKEI</au><au>KIM JAE-HYUN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>METHOD OF FORMING RUGGEDNESS ON PHOTOSENSITIVE INSULATING FILM AND REFLECTION ELECTRODE AND METHOD OF MANUFACTURING LIQUID CRYSTAL DISPLAY HAVING RUGGED STRUCTURE REFLECTION ELECTRODE USING THE SAME</title><date>2003-03-05</date><risdate>2003</risdate><abstract>PROBLEM TO BE SOLVED: To provide a method of forming ruggedness on a photosensitive insulating film having uniform reflectivity and a reflection electrode and a method of manufacturing a liquid crystal display having the rugged structure reflection electrode. SOLUTION: An interval d2 between light shielding patterns 614 in a 1st part corresponding to the upper side of metal patterns 450, 450b, 470, 475 in light shielding patterns 612, 614 of a 2nd mask 610 containing light projecting regions 605, 614 transmitting incident light and the light shielding pattern 612, 614 reflecting incident light is made narrower by a prescribed ratio than an interval d1 between the light shielding patterns 612 corresponding to the upper side of a 2nd part where the metal pattern is absent. The photosensitive insulating film is exposed and developed to form ruggedness on the surface of the photosensitive insulating film. Dents or grooves have the same depth through the photosensitive insulating film and the reflection electrode formed thereon and the uniformity of the reflection efficiency is improved through the whole display region.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTROGRAPHY FREQUENCY-CHANGING HOLOGRAPHY MATERIALS THEREFOR NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF |
| title | METHOD OF FORMING RUGGEDNESS ON PHOTOSENSITIVE INSULATING FILM AND REFLECTION ELECTRODE AND METHOD OF MANUFACTURING LIQUID CRYSTAL DISPLAY HAVING RUGGED STRUCTURE REFLECTION ELECTRODE USING THE SAME |
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