GENERATING METHOD AND DRAWING METHOD FOR DATA FOR DRAWING
PROBLEM TO BE SOLVED: To provide a drawing method which can deal with the increase of the amount of pattern data for drawing and a generating method for drawing data for the drawing method. SOLUTION: In a cell evaluating process, 1st pattern data for drawing are evaluated as specified and cells whic...
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| creator | YAMAJI MASATAKA JINBO YASUO |
| description | PROBLEM TO BE SOLVED: To provide a drawing method which can deal with the increase of the amount of pattern data for drawing and a generating method for drawing data for the drawing method. SOLUTION: In a cell evaluating process, 1st pattern data for drawing are evaluated as specified and cells which are advantageous in data amount for a drawing process when the data are handled as independent drawing data are extracted. In a drawing data generating process, the data for drawing which consist of 2nd pattern data composed of GDSII data in hierarchical structure excluding all the selected cells extracted from the original 1st pattern data for drawing, pattern data composed of GDSII data corresponding to all the cells extracted by the cell evaluating process independently of the 2nd pattern data, and surfacing information data corresponding to the respective pieces of pattern data are generated according to the result of the cell evaluating process. |
| format | Patent |
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SOLUTION: In a cell evaluating process, 1st pattern data for drawing are evaluated as specified and cells which are advantageous in data amount for a drawing process when the data are handled as independent drawing data are extracted. In a drawing data generating process, the data for drawing which consist of 2nd pattern data composed of GDSII data in hierarchical structure excluding all the selected cells extracted from the original 1st pattern data for drawing, pattern data composed of GDSII data corresponding to all the cells extracted by the cell evaluating process independently of the 2nd pattern data, and surfacing information data corresponding to the respective pieces of pattern data are generated according to the result of the cell evaluating process.</description><edition>7</edition><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2003</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20030129&DB=EPODOC&CC=JP&NR=2003029392A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20030129&DB=EPODOC&CC=JP&NR=2003029392A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>YAMAJI MASATAKA</creatorcontrib><creatorcontrib>JINBO YASUO</creatorcontrib><title>GENERATING METHOD AND DRAWING METHOD FOR DATA FOR DRAWING</title><description>PROBLEM TO BE SOLVED: To provide a drawing method which can deal with the increase of the amount of pattern data for drawing and a generating method for drawing data for the drawing method. SOLUTION: In a cell evaluating process, 1st pattern data for drawing are evaluated as specified and cells which are advantageous in data amount for a drawing process when the data are handled as independent drawing data are extracted. In a drawing data generating process, the data for drawing which consist of 2nd pattern data composed of GDSII data in hierarchical structure excluding all the selected cells extracted from the original 1st pattern data for drawing, pattern data composed of GDSII data corresponding to all the cells extracted by the cell evaluating process independently of the 2nd pattern data, and surfacing information data corresponding to the respective pieces of pattern data are generated according to the result of the cell evaluating process.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2003</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLB0d_VzDXIM8fRzV_B1DfHwd1Fw9HNRcAlyDEcScvMPUnBxDHGEMCByPAysaYk5xam8UJqbQcnNNcTZQze1ID8-tbggMTk1L7Uk3ivAyMDA2MDI0tjSyNGYKEUAsN8oyQ</recordid><startdate>20030129</startdate><enddate>20030129</enddate><creator>YAMAJI MASATAKA</creator><creator>JINBO YASUO</creator><scope>EVB</scope></search><sort><creationdate>20030129</creationdate><title>GENERATING METHOD AND DRAWING METHOD FOR DATA FOR DRAWING</title><author>YAMAJI MASATAKA ; JINBO YASUO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2003029392A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2003</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>YAMAJI MASATAKA</creatorcontrib><creatorcontrib>JINBO YASUO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>YAMAJI MASATAKA</au><au>JINBO YASUO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>GENERATING METHOD AND DRAWING METHOD FOR DATA FOR DRAWING</title><date>2003-01-29</date><risdate>2003</risdate><abstract>PROBLEM TO BE SOLVED: To provide a drawing method which can deal with the increase of the amount of pattern data for drawing and a generating method for drawing data for the drawing method. SOLUTION: In a cell evaluating process, 1st pattern data for drawing are evaluated as specified and cells which are advantageous in data amount for a drawing process when the data are handled as independent drawing data are extracted. In a drawing data generating process, the data for drawing which consist of 2nd pattern data composed of GDSII data in hierarchical structure excluding all the selected cells extracted from the original 1st pattern data for drawing, pattern data composed of GDSII data corresponding to all the cells extracted by the cell evaluating process independently of the 2nd pattern data, and surfacing information data corresponding to the respective pieces of pattern data are generated according to the result of the cell evaluating process.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | GENERATING METHOD AND DRAWING METHOD FOR DATA FOR DRAWING |
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