DEVICE FOR TREATMENT OF HALOGEN CONTAINING GAS
PROBLEM TO BE SOLVED: To provide a device for treatment of halogen containing gas, which can realize a highly efficient treatment and a device structure suitable for users' requests in a device for treatment of halogen containing gas by using an electric discharge. SOLUTION: In the device for t...
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| creator | KUZUMOTO MASAKI GOTO TOYOICHI DOI MASAFUMI INANAGA YASUTAKA YOSHIDA KIYOHIKO WADA NOBORU |
| description | PROBLEM TO BE SOLVED: To provide a device for treatment of halogen containing gas, which can realize a highly efficient treatment and a device structure suitable for users' requests in a device for treatment of halogen containing gas by using an electric discharge. SOLUTION: In the device for treatment of halogen containing gas where the halogen containing gas containing a halogen base gas fed between electrodes 331, 332 by a halogen containing gas feed means by generating an electric discharge in the discharge space 333 of a discharge part 33 having the ground side electrode 331 cooled by a cooling water path 335 or the like and the high voltage side electrode 332, a gas pressure in the discharge space 333 is an atmospheric pressure or a nearly atmospheric pressure, an electric discharge length of the discharge space 333 is 1.0 mm or less when only either one of the electrodes 331, 332 is cooled, and that of the discharge space 333 is 4.0 mm or less when both the electrodes 331, 332 are cooled. |
| format | Patent |
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SOLUTION: In the device for treatment of halogen containing gas where the halogen containing gas containing a halogen base gas fed between electrodes 331, 332 by a halogen containing gas feed means by generating an electric discharge in the discharge space 333 of a discharge part 33 having the ground side electrode 331 cooled by a cooling water path 335 or the like and the high voltage side electrode 332, a gas pressure in the discharge space 333 is an atmospheric pressure or a nearly atmospheric pressure, an electric discharge length of the discharge space 333 is 1.0 mm or less when only either one of the electrodes 331, 332 is cooled, and that of the discharge space 333 is 4.0 mm or less when both the electrodes 331, 332 are cooled.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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| subjects | ACYCLIC OR CARBOCYCLIC COMPOUNDS APPARATUS THEREFOR CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSEGASES [GHG] CHEMISTRY GENERAL METHODS OF ORGANIC CHEMISTRY GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS METALLURGY ORGANIC CHEMISTRY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEPARATION TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINSTCLIMATE CHANGE TRANSPORTING |
| title | DEVICE FOR TREATMENT OF HALOGEN CONTAINING GAS |
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