PLATING APPARATUS
PROBLEM TO BE SOLVED: To provide a plating apparatus by which plating of high throwing power can be performed, and further, plating time can be reduced. SOLUTION: The plating apparatus has an anode plate 7, and the body 1 to be plated as the cathode having a fine-sized hole at a prescribed position;...
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creator | WATANABE HIDEO SAWA HIROSHIGE |
description | PROBLEM TO BE SOLVED: To provide a plating apparatus by which plating of high throwing power can be performed, and further, plating time can be reduced. SOLUTION: The plating apparatus has an anode plate 7, and the body 1 to be plated as the cathode having a fine-sized hole at a prescribed position; where they are arranged so as to be confronted at prescribed intervals in a plating solution 6. The apparatus has rolling means eccentrically provided with two rolling elements 4 on both sides of a supporting member 3 suspending and supporting the body 1 to be plated. The apparatus has a bubble generating means 8 generating lots of bubbles 10 rising from the lower direction of the body 1 to be plated along the upper direction in the plating solution 6. The two rolling elements 4 are synchronously rotated, so that the body 1 to be plated is circularly or elliptically shaked in the plane. Further, while forming a rising flow of the bubbles 10 from the lower direction of the body 1 to be plated along the upper direction, plating is applied to the surface including the inside face of the hole of the body 1 to be plated. In this plating apparatus, the shaking amplitude in the plating solution 6 of the body 1 to be plated is controlled to the range of 2 to 10 mm. |
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SOLUTION: The plating apparatus has an anode plate 7, and the body 1 to be plated as the cathode having a fine-sized hole at a prescribed position; where they are arranged so as to be confronted at prescribed intervals in a plating solution 6. The apparatus has rolling means eccentrically provided with two rolling elements 4 on both sides of a supporting member 3 suspending and supporting the body 1 to be plated. The apparatus has a bubble generating means 8 generating lots of bubbles 10 rising from the lower direction of the body 1 to be plated along the upper direction in the plating solution 6. The two rolling elements 4 are synchronously rotated, so that the body 1 to be plated is circularly or elliptically shaked in the plane. Further, while forming a rising flow of the bubbles 10 from the lower direction of the body 1 to be plated along the upper direction, plating is applied to the surface including the inside face of the hole of the body 1 to be plated. In this plating apparatus, the shaking amplitude in the plating solution 6 of the body 1 to be plated is controlled to the range of 2 to 10 mm.</description><edition>7</edition><language>eng</language><subject>APPARATUS THEREFOR ; CHEMISTRY ; ELECTROFORMING ; ELECTROLYTIC OR ELECTROPHORETIC PROCESSES ; METALLURGY ; PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</subject><creationdate>2002</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20020828&DB=EPODOC&CC=JP&NR=2002241999A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,778,883,25547,76298</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20020828&DB=EPODOC&CC=JP&NR=2002241999A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>WATANABE HIDEO</creatorcontrib><creatorcontrib>SAWA HIROSHIGE</creatorcontrib><title>PLATING APPARATUS</title><description>PROBLEM TO BE SOLVED: To provide a plating apparatus by which plating of high throwing power can be performed, and further, plating time can be reduced. SOLUTION: The plating apparatus has an anode plate 7, and the body 1 to be plated as the cathode having a fine-sized hole at a prescribed position; where they are arranged so as to be confronted at prescribed intervals in a plating solution 6. The apparatus has rolling means eccentrically provided with two rolling elements 4 on both sides of a supporting member 3 suspending and supporting the body 1 to be plated. The apparatus has a bubble generating means 8 generating lots of bubbles 10 rising from the lower direction of the body 1 to be plated along the upper direction in the plating solution 6. The two rolling elements 4 are synchronously rotated, so that the body 1 to be plated is circularly or elliptically shaked in the plane. Further, while forming a rising flow of the bubbles 10 from the lower direction of the body 1 to be plated along the upper direction, plating is applied to the surface including the inside face of the hole of the body 1 to be plated. In this plating apparatus, the shaking amplitude in the plating solution 6 of the body 1 to be plated is controlled to the range of 2 to 10 mm.</description><subject>APPARATUS THEREFOR</subject><subject>CHEMISTRY</subject><subject>ELECTROFORMING</subject><subject>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</subject><subject>METALLURGY</subject><subject>PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2002</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZBAM8HEM8fRzV3AMCHAMcgwJDeZhYE1LzClO5YXS3AxKbq4hzh66qQX58anFBYnJqXmpJfFeAUYGBkZGJoaWlpaOxkQpAgBibR5Y</recordid><startdate>20020828</startdate><enddate>20020828</enddate><creator>WATANABE HIDEO</creator><creator>SAWA HIROSHIGE</creator><scope>EVB</scope></search><sort><creationdate>20020828</creationdate><title>PLATING APPARATUS</title><author>WATANABE HIDEO ; SAWA HIROSHIGE</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2002241999A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2002</creationdate><topic>APPARATUS THEREFOR</topic><topic>CHEMISTRY</topic><topic>ELECTROFORMING</topic><topic>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</topic><topic>METALLURGY</topic><topic>PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</topic><toplevel>online_resources</toplevel><creatorcontrib>WATANABE HIDEO</creatorcontrib><creatorcontrib>SAWA HIROSHIGE</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>WATANABE HIDEO</au><au>SAWA HIROSHIGE</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PLATING APPARATUS</title><date>2002-08-28</date><risdate>2002</risdate><abstract>PROBLEM TO BE SOLVED: To provide a plating apparatus by which plating of high throwing power can be performed, and further, plating time can be reduced. SOLUTION: The plating apparatus has an anode plate 7, and the body 1 to be plated as the cathode having a fine-sized hole at a prescribed position; where they are arranged so as to be confronted at prescribed intervals in a plating solution 6. The apparatus has rolling means eccentrically provided with two rolling elements 4 on both sides of a supporting member 3 suspending and supporting the body 1 to be plated. The apparatus has a bubble generating means 8 generating lots of bubbles 10 rising from the lower direction of the body 1 to be plated along the upper direction in the plating solution 6. The two rolling elements 4 are synchronously rotated, so that the body 1 to be plated is circularly or elliptically shaked in the plane. Further, while forming a rising flow of the bubbles 10 from the lower direction of the body 1 to be plated along the upper direction, plating is applied to the surface including the inside face of the hole of the body 1 to be plated. In this plating apparatus, the shaking amplitude in the plating solution 6 of the body 1 to be plated is controlled to the range of 2 to 10 mm.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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recordid | cdi_epo_espacenet_JP2002241999A |
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subjects | APPARATUS THEREFOR CHEMISTRY ELECTROFORMING ELECTROLYTIC OR ELECTROPHORETIC PROCESSES METALLURGY PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS |
title | PLATING APPARATUS |
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