METHOD FOR SEPARATING GALLIUM NITRIDE DEVICE ON LATTICE- MISMATCHED SUBSTRATE

PROBLEM TO BE SOLVED: To separate a GaN device on a lattice-mismatched substrate without impairing visual appearance and without damaging an electric contact or a bonding pad. SOLUTION: This method for separating a semiconductor device comprising a step of providing a substrate having one or more ep...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
1. Verfasser: IMLER WILLIAM R
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To separate a GaN device on a lattice-mismatched substrate without impairing visual appearance and without damaging an electric contact or a bonding pad. SOLUTION: This method for separating a semiconductor device comprising a step of providing a substrate having one or more epitaxial layers on its upper surface, a step of forming a trench in one or more epitaxial layers, and a step of forming a scribe line on the surface of the substrate, is characterized by comprising a step where the position of the scribe line corresponds to the position of the trench and a step of separating the semiconductor device by dividing the wafer along the scribe line.