MASK AND MASK PATTERN FORMING METHOD

PROBLEM TO BE SOLVED: To provide a set of such photomasks that AND of two patterns constitute desired conductive patterns. SOLUTION: The spaces which are formed between the ends of the first conductive pattern 1a and the second conductive pattern 2a and have a prescribed width or below are removed from the original patterns consisting of the plural conductive patterns, by which the first patterns connected with the ends of the first conductive pattern 1a and the second conductive pattern 2a are drawn on the first photomask A. The second patterns having inversion space patterns 6d which have the pattern shapes corresponding to the spaces and are inverted in light shielding parts and translucent parts with respect to the first patterns are drawn on the second photomask B.