METHOD AND DEVICE FOR FORMATION OF MODIFIED FILM

METHOD AND DEVICE FOR FORMATION OF MODIFIED FILM

PROBLEM TO BE SOLVED: To realize a formation method of a charging prevention film which is well consistent with a lithography process. SOLUTION: A polyamide acid film 32 is formed by a rotary coating method and then the polyamide acid film 32 is heated and the polyamide acid film 32 is converted to...

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Hauptverfasser: ONISHI KIYONOBU, NAKASUGI TETSUO
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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creator ONISHI KIYONOBU
NAKASUGI TETSUO
description PROBLEM TO BE SOLVED: To realize a formation method of a charging prevention film which is well consistent with a lithography process. SOLUTION: A polyamide acid film 32 is formed by a rotary coating method and then the polyamide acid film 32 is heated and the polyamide acid film 32 is converted to a polyimide film 33. Thereafter, the polyimide film 33 is irradiated with energy beam 13 and graphitized. Thereby, resistance of the polyimide film 33 is lowered so as to be used as a charging prevention film.
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title METHOD AND DEVICE FOR FORMATION OF MODIFIED FILM
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