REFLECTION BASE PHOTOSENSITIVE ELEMENT, METHOD FOR MANUFACTURING PHOTOSENSITIVE LAYER LAMINATED SUBSTRATE BY USING THE SAME, METHOD FOR MANUFACTURING SUBSTRATE LAMINATED WITH DIFFUSION REFLECTION BASE LAYER AND METHOD FOR MANUFACTURING DIFFUSION REFLECTING PLATE
PROBLEM TO BE SOLVED: To provide a diffusion reflecting plate excellent in chemical resistance, heat resistance, workability and productivity and free from partial peeling of a metallic thin film. SOLUTION: The reflection base photosensitive element is obtained by laminating a photosensitive layer (...
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| creator | YAMAZAKI HIROSHI FURUBAYASHI HIROMI MUKAI IKUO |
| description | PROBLEM TO BE SOLVED: To provide a diffusion reflecting plate excellent in chemical resistance, heat resistance, workability and productivity and free from partial peeling of a metallic thin film. SOLUTION: The reflection base photosensitive element is obtained by laminating a photosensitive layer (B) containing a photopolymerizable compound expressed by general formula I having one or more ethylenically unsaturated groups and one or more urethane bonds in the molecule, or a photosensitive layer (B') containing an acrylic polymer having photopolymerizable unsaturated groups, or a photosensitive layer (B") containing an acrylic polymer having aryl groups on a supporting film having a layer with recesses and projections, with the photosensitive layer formed in the side of the layer with recesses and projections. The photosensitive laminated substrate is obtained by laminating the above photosensitive element B on a substrate with the photosensitive layer B in contact with the substrate. In formula, R1 is independently a hydrogen atom or methyl group, R2 is independently a 2-8C alkylene group, R3 is independently a hexamethylene, trimethyl hexamethylene, isophorone, tolylene or xylene group, and m and n are integers 1 to 3 and 10 to 200, respectively. |
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SOLUTION: The reflection base photosensitive element is obtained by laminating a photosensitive layer (B) containing a photopolymerizable compound expressed by general formula I having one or more ethylenically unsaturated groups and one or more urethane bonds in the molecule, or a photosensitive layer (B') containing an acrylic polymer having photopolymerizable unsaturated groups, or a photosensitive layer (B") containing an acrylic polymer having aryl groups on a supporting film having a layer with recesses and projections, with the photosensitive layer formed in the side of the layer with recesses and projections. The photosensitive laminated substrate is obtained by laminating the above photosensitive element B on a substrate with the photosensitive layer B in contact with the substrate. In formula, R1 is independently a hydrogen atom or methyl group, R2 is independently a 2-8C alkylene group, R3 is independently a hexamethylene, trimethyl hexamethylene, isophorone, tolylene or xylene group, and m and n are integers 1 to 3 and 10 to 200, respectively.</description><edition>7</edition><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ; ELECTROGRAPHY ; FREQUENCY-CHANGING ; HOLOGRAPHY ; LAYERED PRODUCTS ; LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM ; MATERIALS THEREFOR ; NON-LINEAR OPTICS ; OPTICAL ANALOGUE/DIGITAL CONVERTERS ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICAL LOGIC ELEMENTS ; OPTICS ; ORIGINALS THEREFOR ; PERFORMING OPERATIONS ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF ; TRANSPORTING</subject><creationdate>2002</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20020220&DB=EPODOC&CC=JP&NR=2002055214A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20020220&DB=EPODOC&CC=JP&NR=2002055214A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>YAMAZAKI HIROSHI</creatorcontrib><creatorcontrib>FURUBAYASHI HIROMI</creatorcontrib><creatorcontrib>MUKAI IKUO</creatorcontrib><title>REFLECTION BASE PHOTOSENSITIVE ELEMENT, METHOD FOR MANUFACTURING PHOTOSENSITIVE LAYER LAMINATED SUBSTRATE BY USING THE SAME, METHOD FOR MANUFACTURING SUBSTRATE LAMINATED WITH DIFFUSION REFLECTION BASE LAYER AND METHOD FOR MANUFACTURING DIFFUSION REFLECTING PLATE</title><description>PROBLEM TO BE SOLVED: To provide a diffusion reflecting plate excellent in chemical resistance, heat resistance, workability and productivity and free from partial peeling of a metallic thin film. SOLUTION: The reflection base photosensitive element is obtained by laminating a photosensitive layer (B) containing a photopolymerizable compound expressed by general formula I having one or more ethylenically unsaturated groups and one or more urethane bonds in the molecule, or a photosensitive layer (B') containing an acrylic polymer having photopolymerizable unsaturated groups, or a photosensitive layer (B") containing an acrylic polymer having aryl groups on a supporting film having a layer with recesses and projections, with the photosensitive layer formed in the side of the layer with recesses and projections. The photosensitive laminated substrate is obtained by laminating the above photosensitive element B on a substrate with the photosensitive layer B in contact with the substrate. In formula, R1 is independently a hydrogen atom or methyl group, R2 is independently a 2-8C alkylene group, R3 is independently a hexamethylene, trimethyl hexamethylene, isophorone, tolylene or xylene group, and m and n are integers 1 to 3 and 10 to 200, respectively.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING</subject><subject>ELECTROGRAPHY</subject><subject>FREQUENCY-CHANGING</subject><subject>HOLOGRAPHY</subject><subject>LAYERED PRODUCTS</subject><subject>LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM</subject><subject>MATERIALS THEREFOR</subject><subject>NON-LINEAR OPTICS</subject><subject>OPTICAL ANALOGUE/DIGITAL CONVERTERS</subject><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICAL LOGIC ELEMENTS</subject><subject>OPTICS</subject><subject>ORIGINALS THEREFOR</subject><subject>PERFORMING OPERATIONS</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2002</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjkEKwjAQRXWhIOodBtcKteoB0nZiIk1SkoniSkTiSlTQ-2OKQkFR3MzM4r83v9fuWuQl5iSNhow5hEoYMg61kyTXCFiiQk1jUEjCFMCNBcW05ywnb6VevgMl26KNU0nNCAtwPnNk4wnZFryrCRIIjin8IW2oxrSRJKCQnEdLbPte_PmY6eK79ROu-5fRPmh1jvvTLQxfu98acaRcTML1sgu36_4QzuG-W1VpkqTJYpFO52z2V-gBv0NhBg</recordid><startdate>20020220</startdate><enddate>20020220</enddate><creator>YAMAZAKI HIROSHI</creator><creator>FURUBAYASHI HIROMI</creator><creator>MUKAI IKUO</creator><scope>EVB</scope></search><sort><creationdate>20020220</creationdate><title>REFLECTION BASE PHOTOSENSITIVE ELEMENT, METHOD FOR MANUFACTURING PHOTOSENSITIVE LAYER LAMINATED SUBSTRATE BY USING THE SAME, METHOD FOR MANUFACTURING SUBSTRATE LAMINATED WITH DIFFUSION REFLECTION BASE LAYER AND METHOD FOR MANUFACTURING DIFFUSION REFLECTING PLATE</title><author>YAMAZAKI HIROSHI ; FURUBAYASHI HIROMI ; MUKAI IKUO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2002055214A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2002</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING</topic><topic>ELECTROGRAPHY</topic><topic>FREQUENCY-CHANGING</topic><topic>HOLOGRAPHY</topic><topic>LAYERED PRODUCTS</topic><topic>LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM</topic><topic>MATERIALS THEREFOR</topic><topic>NON-LINEAR OPTICS</topic><topic>OPTICAL ANALOGUE/DIGITAL CONVERTERS</topic><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICAL LOGIC ELEMENTS</topic><topic>OPTICS</topic><topic>ORIGINALS THEREFOR</topic><topic>PERFORMING OPERATIONS</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>YAMAZAKI HIROSHI</creatorcontrib><creatorcontrib>FURUBAYASHI HIROMI</creatorcontrib><creatorcontrib>MUKAI IKUO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>YAMAZAKI HIROSHI</au><au>FURUBAYASHI HIROMI</au><au>MUKAI IKUO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>REFLECTION BASE PHOTOSENSITIVE ELEMENT, METHOD FOR MANUFACTURING PHOTOSENSITIVE LAYER LAMINATED SUBSTRATE BY USING THE SAME, METHOD FOR MANUFACTURING SUBSTRATE LAMINATED WITH DIFFUSION REFLECTION BASE LAYER AND METHOD FOR MANUFACTURING DIFFUSION REFLECTING PLATE</title><date>2002-02-20</date><risdate>2002</risdate><abstract>PROBLEM TO BE SOLVED: To provide a diffusion reflecting plate excellent in chemical resistance, heat resistance, workability and productivity and free from partial peeling of a metallic thin film. SOLUTION: The reflection base photosensitive element is obtained by laminating a photosensitive layer (B) containing a photopolymerizable compound expressed by general formula I having one or more ethylenically unsaturated groups and one or more urethane bonds in the molecule, or a photosensitive layer (B') containing an acrylic polymer having photopolymerizable unsaturated groups, or a photosensitive layer (B") containing an acrylic polymer having aryl groups on a supporting film having a layer with recesses and projections, with the photosensitive layer formed in the side of the layer with recesses and projections. The photosensitive laminated substrate is obtained by laminating the above photosensitive element B on a substrate with the photosensitive layer B in contact with the substrate. In formula, R1 is independently a hydrogen atom or methyl group, R2 is independently a 2-8C alkylene group, R3 is independently a hexamethylene, trimethyl hexamethylene, isophorone, tolylene or xylene group, and m and n are integers 1 to 3 and 10 to 200, respectively.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTROGRAPHY FREQUENCY-CHANGING HOLOGRAPHY LAYERED PRODUCTS LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM MATERIALS THEREFOR NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICAL LOGIC ELEMENTS OPTICS ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF TRANSPORTING |
| title | REFLECTION BASE PHOTOSENSITIVE ELEMENT, METHOD FOR MANUFACTURING PHOTOSENSITIVE LAYER LAMINATED SUBSTRATE BY USING THE SAME, METHOD FOR MANUFACTURING SUBSTRATE LAMINATED WITH DIFFUSION REFLECTION BASE LAYER AND METHOD FOR MANUFACTURING DIFFUSION REFLECTING PLATE |
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