CHEMICAL AMPLIFICATION TYPE POSITIVE RESIST COMPOSITION

PROBLEM TO BE SOLVED: To provide a chemical amplification type positive resist composition excellent in adhesiveness to a substrate and dry etching resistance and having various good resist performances such as resolution and sensitivity. SOLUTION: The chemical amplification type positive type resis...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KIN SEIKEN, KAMIYA YASUNORI, TAKADA YOSHIYUKI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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