DEVICE AND METHOD FOR TREATING WASTE GAS CONTAINING VOLATILE ORGANIC MATERIAL

DEVICE AND METHOD FOR TREATING WASTE GAS CONTAINING VOLATILE ORGANIC MATERIAL

PROBLEM TO BE SOLVED: To provide a waste gas treating method by which volatile organic material can be treated economically and efficiently while preventing secondary pollution. SOLUTION: The waste gas containing volatile organic material is treated by introducing it to a normal pressure low tempera...

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Hauptverfasser: IMAHAMA TOSHINOBU, YANO DAISAKU
Format: Patent
Sprache:eng
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PERFORMING OPERATIONS
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
SEPARATION
TRANSPORTING
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creator IMAHAMA TOSHINOBU
YANO DAISAKU
description PROBLEM TO BE SOLVED: To provide a waste gas treating method by which volatile organic material can be treated economically and efficiently while preventing secondary pollution. SOLUTION: The waste gas containing volatile organic material is treated by introducing it to a normal pressure low temperature microwave plasma device 10 and subjecting the waste gas to absorption treatment with a scrubber 40 after decomposition treatment.
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PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
SEPARATION
TRANSPORTING
title DEVICE AND METHOD FOR TREATING WASTE GAS CONTAINING VOLATILE ORGANIC MATERIAL
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