WORK MOVING TYPE REACTIVE SPUTTERING DEVICE, AND ITS METHOD

PROBLEM TO BE SOLVED: To improve reaction to the difference in the size of a CRT mount truck, to eliminate the necessity of changing the gas, and to prevent the transfer time of the CRT truck from being increased by the presence of the gas changing time in a work moving type (carrying truck in-line...

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Bibliographische Detailangaben
Hauptverfasser:	ARAKI MUNEYA, SUMIDA KOSEI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To improve reaction to the difference in the size of a CRT mount truck, to eliminate the necessity of changing the gas, and to prevent the transfer time of the CRT truck from being increased by the presence of the gas changing time in a work moving type (carrying truck in-line system) reactive sputtering device in which a plurality of process parts are continuously provided via a separation part, an independent gas atmosphere is formed in each process part, and different films are formed through the sputtering. SOLUTION: A separation gas curtain is formed by providing a means 5 to feed the separation gas, for example, the inert gas of Ar gas in a substantially perpendicular direction, and separation is implemented between the discharge gas atmospheres in processes 2A, 2B by arranging a screen-like shield 8 in a separation part 3, the independent sputtering is implemented in the respective process parts 2A, 2B in this condition, and the movement is implemented between the process parts 2A, 2B of the CRT.