WASTE GAS TREATING DEVICE FOR SEMICONDUCTOR PRODUCTION DEVICE

WASTE GAS TREATING DEVICE FOR SEMICONDUCTOR PRODUCTION DEVICE

PROBLEM TO BE SOLVED: To efficiently treat fluoride which is chemically stable in waste gas by disposing a device for removing the material to be stuck in the pump and clogging the pump, at a proceeding stage of the vacuum pump for sucking the waste gas from a semiconductor production device and for...

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Hauptverfasser: NITTA AKIHIKO, SUGIMORI YOSHIAKI
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Sprache:eng
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PERFORMING OPERATIONS
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
SEPARATION
TRANSPORTING
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creator NITTA AKIHIKO
SUGIMORI YOSHIAKI
description PROBLEM TO BE SOLVED: To efficiently treat fluoride which is chemically stable in waste gas by disposing a device for removing the material to be stuck in the pump and clogging the pump, at a proceeding stage of the vacuum pump for sucking the waste gas from a semiconductor production device and for sending the waste gas to a waste gas treating device and a fluoride treating device. SOLUTION: A removing device 11 for removing the material to be stuck in the vacuum pump and clogging the vacuum pump is disposed at the proceeding stage of the vacuum pump 5 at a waste gas route 2 for discharging the waste gas from the semiconductor production device 1. The clogging of the vacuum pump 5 is prevented even if the flow rate of the pump protecting gas introduced from a protecting gas route 6 is reduced by previously removing the material clogging the vacuum pump by the removing device 11 in this manner. Therefore, a fluoride concn. in the gas flowing into a fluoride recovering device 4 is increased even if the waste gas and the pump protecting gas are mixed at the vacuum pump 5 and the recovering efficiency of the fluoride is economically improved.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2001000838A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2001000838A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2001000838A3</originalsourceid><addsrcrecordid>eNrjZLANdwwOcVVwdwxWCAlydQzx9HNXcHEN83R2VXDzD1IIdvX1dPb3cwl1DgHyAoL8QSxPfz-oGh4G1rTEnOJUXijNzaDk5hri7KGbWpAfn1pckJicmpdaEu8VYGRgYGhgYGBhbOFoTJQiAIfxKk4</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>WASTE GAS TREATING DEVICE FOR SEMICONDUCTOR PRODUCTION DEVICE</title><source>esp@cenet</source><creator>NITTA AKIHIKO ; SUGIMORI YOSHIAKI</creator><creatorcontrib>NITTA AKIHIKO ; SUGIMORI YOSHIAKI</creatorcontrib><description>PROBLEM TO BE SOLVED: To efficiently treat fluoride which is chemically stable in waste gas by disposing a device for removing the material to be stuck in the pump and clogging the pump, at a proceeding stage of the vacuum pump for sucking the waste gas from a semiconductor production device and for sending the waste gas to a waste gas treating device and a fluoride treating device. SOLUTION: A removing device 11 for removing the material to be stuck in the vacuum pump and clogging the vacuum pump is disposed at the proceeding stage of the vacuum pump 5 at a waste gas route 2 for discharging the waste gas from the semiconductor production device 1. The clogging of the vacuum pump 5 is prevented even if the flow rate of the pump protecting gas introduced from a protecting gas route 6 is reduced by previously removing the material clogging the vacuum pump by the removing device 11 in this manner. Therefore, a fluoride concn. in the gas flowing into a fluoride recovering device 4 is increased even if the waste gas and the pump protecting gas are mixed at the vacuum pump 5 and the recovering efficiency of the fluoride is economically improved.</description><edition>7</edition><language>eng</language><subject>PERFORMING OPERATIONS ; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL ; SEPARATION ; TRANSPORTING</subject><creationdate>2001</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20010109&amp;DB=EPODOC&amp;CC=JP&amp;NR=2001000838A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20010109&amp;DB=EPODOC&amp;CC=JP&amp;NR=2001000838A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>NITTA AKIHIKO</creatorcontrib><creatorcontrib>SUGIMORI YOSHIAKI</creatorcontrib><title>WASTE GAS TREATING DEVICE FOR SEMICONDUCTOR PRODUCTION DEVICE</title><description>PROBLEM TO BE SOLVED: To efficiently treat fluoride which is chemically stable in waste gas by disposing a device for removing the material to be stuck in the pump and clogging the pump, at a proceeding stage of the vacuum pump for sucking the waste gas from a semiconductor production device and for sending the waste gas to a waste gas treating device and a fluoride treating device. SOLUTION: A removing device 11 for removing the material to be stuck in the vacuum pump and clogging the vacuum pump is disposed at the proceeding stage of the vacuum pump 5 at a waste gas route 2 for discharging the waste gas from the semiconductor production device 1. The clogging of the vacuum pump 5 is prevented even if the flow rate of the pump protecting gas introduced from a protecting gas route 6 is reduced by previously removing the material clogging the vacuum pump by the removing device 11 in this manner. Therefore, a fluoride concn. in the gas flowing into a fluoride recovering device 4 is increased even if the waste gas and the pump protecting gas are mixed at the vacuum pump 5 and the recovering efficiency of the fluoride is economically improved.</description><subject>PERFORMING OPERATIONS</subject><subject>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</subject><subject>SEPARATION</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2001</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLANdwwOcVVwdwxWCAlydQzx9HNXcHEN83R2VXDzD1IIdvX1dPb3cwl1DgHyAoL8QSxPfz-oGh4G1rTEnOJUXijNzaDk5hri7KGbWpAfn1pckJicmpdaEu8VYGRgYGhgYGBhbOFoTJQiAIfxKk4</recordid><startdate>20010109</startdate><enddate>20010109</enddate><creator>NITTA AKIHIKO</creator><creator>SUGIMORI YOSHIAKI</creator><scope>EVB</scope></search><sort><creationdate>20010109</creationdate><title>WASTE GAS TREATING DEVICE FOR SEMICONDUCTOR PRODUCTION DEVICE</title><author>NITTA AKIHIKO ; SUGIMORI YOSHIAKI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2001000838A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2001</creationdate><topic>PERFORMING OPERATIONS</topic><topic>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</topic><topic>SEPARATION</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>NITTA AKIHIKO</creatorcontrib><creatorcontrib>SUGIMORI YOSHIAKI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>NITTA AKIHIKO</au><au>SUGIMORI YOSHIAKI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>WASTE GAS TREATING DEVICE FOR SEMICONDUCTOR PRODUCTION DEVICE</title><date>2001-01-09</date><risdate>2001</risdate><abstract>PROBLEM TO BE SOLVED: To efficiently treat fluoride which is chemically stable in waste gas by disposing a device for removing the material to be stuck in the pump and clogging the pump, at a proceeding stage of the vacuum pump for sucking the waste gas from a semiconductor production device and for sending the waste gas to a waste gas treating device and a fluoride treating device. SOLUTION: A removing device 11 for removing the material to be stuck in the vacuum pump and clogging the vacuum pump is disposed at the proceeding stage of the vacuum pump 5 at a waste gas route 2 for discharging the waste gas from the semiconductor production device 1. The clogging of the vacuum pump 5 is prevented even if the flow rate of the pump protecting gas introduced from a protecting gas route 6 is reduced by previously removing the material clogging the vacuum pump by the removing device 11 in this manner. Therefore, a fluoride concn. in the gas flowing into a fluoride recovering device 4 is increased even if the waste gas and the pump protecting gas are mixed at the vacuum pump 5 and the recovering efficiency of the fluoride is economically improved.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record>
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subjects PERFORMING OPERATIONS
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
SEPARATION
TRANSPORTING
title WASTE GAS TREATING DEVICE FOR SEMICONDUCTOR PRODUCTION DEVICE
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-02T16%3A23%3A07IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=NITTA%20AKIHIKO&rft.date=2001-01-09&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJP2001000838A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true