WASTE GAS TREATING DEVICE FOR SEMICONDUCTOR PRODUCTION DEVICE

PROBLEM TO BE SOLVED: To efficiently treat fluoride which is chemically stable in waste gas by disposing a device for removing the material to be stuck in the pump and clogging the pump, at a proceeding stage of the vacuum pump for sucking the waste gas from a semiconductor production device and for...

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Bibliographische Detailangaben
Hauptverfasser:	NITTA AKIHIKO, SUGIMORI YOSHIAKI
Format:	Patent
Sprache:	eng
Schlagworte:	PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEPARATION TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To efficiently treat fluoride which is chemically stable in waste gas by disposing a device for removing the material to be stuck in the pump and clogging the pump, at a proceeding stage of the vacuum pump for sucking the waste gas from a semiconductor production device and for sending the waste gas to a waste gas treating device and a fluoride treating device. SOLUTION: A removing device 11 for removing the material to be stuck in the vacuum pump and clogging the vacuum pump is disposed at the proceeding stage of the vacuum pump 5 at a waste gas route 2 for discharging the waste gas from the semiconductor production device 1. The clogging of the vacuum pump 5 is prevented even if the flow rate of the pump protecting gas introduced from a protecting gas route 6 is reduced by previously removing the material clogging the vacuum pump by the removing device 11 in this manner. Therefore, a fluoride concn. in the gas flowing into a fluoride recovering device 4 is increased even if the waste gas and the pump protecting gas are mixed at the vacuum pump 5 and the recovering efficiency of the fluoride is economically improved.