POROUS FILM AND ITS PRODUCTION

POROUS FILM AND ITS PRODUCTION

PROBLEM TO BE SOLVED: To provide a porous film resistant to thermal shrinkage and having high strength and high porosity and provide its production process. SOLUTION: The porous film is composed of an ultra-high molecular weight polyolefin having a weight-average molecular weight of >=1×106 and a...

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Hauptverfasser: YAMAGUCHI MUTSUKO, NOMI TOSHISUKE, YAMAMOTO KAZUNARI, ICHIKAWA TOMOAKI
Format: Patent
Sprache:eng
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AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G
CHEMISTRY
COMPOSITIONS BASED THEREON
GENERAL PROCESSES OF COMPOUNDING
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
THEIR PREPARATION OR CHEMICAL WORKING-UP
WORKING-UP
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creator YAMAGUCHI MUTSUKO
NOMI TOSHISUKE
YAMAMOTO KAZUNARI
ICHIKAWA TOMOAKI
description PROBLEM TO BE SOLVED: To provide a porous film resistant to thermal shrinkage and having high strength and high porosity and provide its production process. SOLUTION: The porous film is composed of an ultra-high molecular weight polyolefin having a weight-average molecular weight of >=1×106 and a weight- average molecular weight/number-average molecular weight ratio of =40% and the thermal shrinkage of =1×106 and a weight-average molecular weight/number-average molecular weight ratio of
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SOLUTION: The porous film is composed of an ultra-high molecular weight polyolefin having a weight-average molecular weight of &gt;=1×106 and a weight- average molecular weight/number-average molecular weight ratio of &lt;=9 and characterized by the porosity of &gt;=40% and the thermal shrinkage of &lt;=20%. It can be produced by kneading a resin composition containing an ultra-high molecular weight polyolefin having a weight-average molecular weight of &gt;=1×106 and a weight-average molecular weight/number-average molecular weight ratio of &lt;=9 and a solvent, forming the kneaded mixture in the form of a sheet, subjecting the film to drawing and solvent removing treatment, drawing and desolvating the treated sheet and heat-setting the product at a temperature higher than the melting point (Tm) of the ultra-high molecular weight polyolefin and &lt;=Tm+10 deg.C.</description><edition>7</edition><language>eng</language><subject>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G ; CHEMISTRY ; COMPOSITIONS BASED THEREON ; GENERAL PROCESSES OF COMPOUNDING ; METALLURGY ; ORGANIC MACROMOLECULAR COMPOUNDS ; THEIR PREPARATION OR CHEMICAL WORKING-UP ; WORKING-UP</subject><creationdate>2000</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20000912&amp;DB=EPODOC&amp;CC=JP&amp;NR=2000248094A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20000912&amp;DB=EPODOC&amp;CC=JP&amp;NR=2000248094A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>YAMAGUCHI MUTSUKO</creatorcontrib><creatorcontrib>NOMI TOSHISUKE</creatorcontrib><creatorcontrib>YAMAMOTO KAZUNARI</creatorcontrib><creatorcontrib>ICHIKAWA TOMOAKI</creatorcontrib><title>POROUS FILM AND ITS PRODUCTION</title><description>PROBLEM TO BE SOLVED: To provide a porous film resistant to thermal shrinkage and having high strength and high porosity and provide its production process. 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subjects AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G
CHEMISTRY
COMPOSITIONS BASED THEREON
GENERAL PROCESSES OF COMPOUNDING
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
THEIR PREPARATION OR CHEMICAL WORKING-UP
WORKING-UP
title POROUS FILM AND ITS PRODUCTION
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