CHARGED PARTICLE BEAM DEVICE

PROBLEM TO BE SOLVED: To provide a charged particle beam device reducing load of a host computer for smoothly performing processing. SOLUTION: A focusing ion beam device 101 is connected to a LAN 109 in a plant through a LAN. A host computer 102, an optical system control unit 103 controlling a focu...

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Hauptverfasser:	MATSUMURA HIROSHI, MURAMATSU MASAJI, DOI TOSHIO, FUJII TOSHIAKI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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creator	MATSUMURA HIROSHI MURAMATSU MASAJI DOI TOSHIO FUJII TOSHIAKI
description	PROBLEM TO BE SOLVED: To provide a charged particle beam device reducing load of a host computer for smoothly performing processing. SOLUTION: A focusing ion beam device 101 is connected to a LAN 109 in a plant through a LAN. A host computer 102, an optical system control unit 103 controlling a focus and a magnification of an ion beam by an electric field, an optical axis control unit 104 positioning an ion source, a vacuum exhaust unit 105 evacuating a sample chamber into a vacuum atmosphere, a sample stage 106 carrying a sample and moving to a beam irradiation position, and a sample conveying device 107 conveying the sample to the sample stage 106 are connected to a bus line 108 so as to be controlled in noncentralized operation.
format	Patent
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subjects	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
title	CHARGED PARTICLE BEAM DEVICE
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