ITO TARGET
PROBLEM TO BE SOLVED: To provide an ITO target by which a transparent electrically conductive film excellent in resistant to blackening and having such a low resistivity of 1.7×104 Ω cm is stably obtained. SOLUTION: In the ITO sintered body obtained by molding ITO powder having a high degree of sint...
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| creator | AMO RYUICHI OKABE KATSUAKI OTAKI MITSUNOBU YOKOGAWA TOSHIO EJIMA KOICHIRO |
| description | PROBLEM TO BE SOLVED: To provide an ITO target by which a transparent electrically conductive film excellent in resistant to blackening and having such a low resistivity of 1.7×104 Ω cm is stably obtained. SOLUTION: In the ITO sintered body obtained by molding ITO powder having a high degree of sintering with the specific surface (BET) of the raw powder controlled to 30 m2/g and all grain diameters of the granulated powder to |
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SOLUTION: In the ITO sintered body obtained by molding ITO powder having a high degree of sintering with the specific surface (BET) of the raw powder controlled to 30 m2/g and all grain diameters of the granulated powder to <=200 μm and sintering the body, in which micropores of <=5 μm diameter are uniformly dispersed, and exhibiting >=94.8% relative density, the ITO target is not blackened even when used to 50% of the service life (when the depth of erosion in sputtering reaches the thickness of the target).</description><edition>7</edition><language>eng</language><subject>ARTIFICIAL STONE ; BASIC ELECTRIC ELEMENTS ; CABLES ; CEMENTS ; CERAMICS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS ; CONCRETE ; CONDUCTORS ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; INSULATORS ; LIME, MAGNESIA ; METALLURGY ; REFRACTORIES ; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES ; SLAG ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION ; TREATMENT OF NATURAL STONE</subject><creationdate>2000</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20000526&DB=EPODOC&CC=JP&NR=2000144398A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20000526&DB=EPODOC&CC=JP&NR=2000144398A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>AMO RYUICHI</creatorcontrib><creatorcontrib>OKABE KATSUAKI</creatorcontrib><creatorcontrib>OTAKI MITSUNOBU</creatorcontrib><creatorcontrib>YOKOGAWA TOSHIO</creatorcontrib><creatorcontrib>EJIMA KOICHIRO</creatorcontrib><title>ITO TARGET</title><description>PROBLEM TO BE SOLVED: To provide an ITO target by which a transparent electrically conductive film excellent in resistant to blackening and having such a low resistivity of 1.7×104 Ω cm is stably obtained. SOLUTION: In the ITO sintered body obtained by molding ITO powder having a high degree of sintering with the specific surface (BET) of the raw powder controlled to 30 m2/g and all grain diameters of the granulated powder to <=200 μm and sintering the body, in which micropores of <=5 μm diameter are uniformly dispersed, and exhibiting >=94.8% relative density, the ITO target is not blackened even when used to 50% of the service life (when the depth of erosion in sputtering reaches the thickness of the target).</description><subject>ARTIFICIAL STONE</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CABLES</subject><subject>CEMENTS</subject><subject>CERAMICS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS</subject><subject>CONCRETE</subject><subject>CONDUCTORS</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>INSULATORS</subject><subject>LIME, MAGNESIA</subject><subject>METALLURGY</subject><subject>REFRACTORIES</subject><subject>SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES</subject><subject>SLAG</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><subject>TREATMENT OF NATURAL STONE</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2000</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZODyDPFXCHEMcncN4WFgTUvMKU7lhdLcDEpuriHOHrqpBfnxqcUFicmpeakl8V4BRgYGBoYmJsaWFo7GRCkCAIkeHDY</recordid><startdate>20000526</startdate><enddate>20000526</enddate><creator>AMO RYUICHI</creator><creator>OKABE KATSUAKI</creator><creator>OTAKI MITSUNOBU</creator><creator>YOKOGAWA TOSHIO</creator><creator>EJIMA KOICHIRO</creator><scope>EVB</scope></search><sort><creationdate>20000526</creationdate><title>ITO TARGET</title><author>AMO RYUICHI ; OKABE KATSUAKI ; OTAKI MITSUNOBU ; YOKOGAWA TOSHIO ; EJIMA KOICHIRO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2000144398A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2000</creationdate><topic>ARTIFICIAL STONE</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CABLES</topic><topic>CEMENTS</topic><topic>CERAMICS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS</topic><topic>CONCRETE</topic><topic>CONDUCTORS</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>INSULATORS</topic><topic>LIME, MAGNESIA</topic><topic>METALLURGY</topic><topic>REFRACTORIES</topic><topic>SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES</topic><topic>SLAG</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><topic>TREATMENT OF NATURAL STONE</topic><toplevel>online_resources</toplevel><creatorcontrib>AMO RYUICHI</creatorcontrib><creatorcontrib>OKABE KATSUAKI</creatorcontrib><creatorcontrib>OTAKI MITSUNOBU</creatorcontrib><creatorcontrib>YOKOGAWA TOSHIO</creatorcontrib><creatorcontrib>EJIMA KOICHIRO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>AMO RYUICHI</au><au>OKABE KATSUAKI</au><au>OTAKI MITSUNOBU</au><au>YOKOGAWA TOSHIO</au><au>EJIMA KOICHIRO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>ITO TARGET</title><date>2000-05-26</date><risdate>2000</risdate><abstract>PROBLEM TO BE SOLVED: To provide an ITO target by which a transparent electrically conductive film excellent in resistant to blackening and having such a low resistivity of 1.7×104 Ω cm is stably obtained. SOLUTION: In the ITO sintered body obtained by molding ITO powder having a high degree of sintering with the specific surface (BET) of the raw powder controlled to 30 m2/g and all grain diameters of the granulated powder to <=200 μm and sintering the body, in which micropores of <=5 μm diameter are uniformly dispersed, and exhibiting >=94.8% relative density, the ITO target is not blackened even when used to 50% of the service life (when the depth of erosion in sputtering reaches the thickness of the target).</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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| subjects | ARTIFICIAL STONE BASIC ELECTRIC ELEMENTS CABLES CEMENTS CERAMICS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS CONCRETE CONDUCTORS DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INSULATORS LIME, MAGNESIA METALLURGY REFRACTORIES SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES SLAG SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TREATMENT OF NATURAL STONE |
| title | ITO TARGET |
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