HEAT DEVELOPABLE PHOTOSENSITIVE MATERIAL

PROBLEM TO BE SOLVED: To obtain a heat developable photosensitive material that suppresses the emission of a foul odor in heat development by specifying the amount of a solvent contained in a photosensitive material. SOLUTION: It is preferable that the amount of a solvent contained in a heat develop...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: SUNAGA TETSURO, IWASAKI KEIKO
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator SUNAGA TETSURO
IWASAKI KEIKO
description PROBLEM TO BE SOLVED: To obtain a heat developable photosensitive material that suppresses the emission of a foul odor in heat development by specifying the amount of a solvent contained in a photosensitive material. SOLUTION: It is preferable that the amount of a solvent contained in a heat developable photosensitive material is made as small as possible from the viewpoint of a foul odor, but when the photosensitive material is dried up or nearly dried up, the heat developability deteriorates extremely. The amount of the residual solvent in the photosensitive material is adjusted to 10-100 mg/m3 so as to suppress the emission of a foul odor without deteriorating the heat developability. The amount may be adjusted by reducing the amount of a binder, raising drying temperature or prolonging drying time but the raising of drying temperature is not so favorable because it is accompanied by the increase of fog. The objective heat developable photosensitive material that suppresses the emission of a foul odor in heat development is obtained.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2000122212A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2000122212A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2000122212A3</originalsourceid><addsrcrecordid>eNrjZNDwcHUMUXBxDXP18Q9wdPJxVQjw8A_xD3b1C_YM8QxzVfB1DHEN8nT04WFgTUvMKU7lhdLcDEpuriHOHrqpBfnxqcUFicmpeakl8V4BRgYGBoZGRkaGRo7GRCkCAF8oJJM</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>HEAT DEVELOPABLE PHOTOSENSITIVE MATERIAL</title><source>esp@cenet</source><creator>SUNAGA TETSURO ; IWASAKI KEIKO</creator><creatorcontrib>SUNAGA TETSURO ; IWASAKI KEIKO</creatorcontrib><description>PROBLEM TO BE SOLVED: To obtain a heat developable photosensitive material that suppresses the emission of a foul odor in heat development by specifying the amount of a solvent contained in a photosensitive material. SOLUTION: It is preferable that the amount of a solvent contained in a heat developable photosensitive material is made as small as possible from the viewpoint of a foul odor, but when the photosensitive material is dried up or nearly dried up, the heat developability deteriorates extremely. The amount of the residual solvent in the photosensitive material is adjusted to 10-100 mg/m3 so as to suppress the emission of a foul odor without deteriorating the heat developability. The amount may be adjusted by reducing the amount of a binder, raising drying temperature or prolonging drying time but the raising of drying temperature is not so favorable because it is accompanied by the increase of fog. The objective heat developable photosensitive material that suppresses the emission of a foul odor in heat development is obtained.</description><edition>7</edition><language>eng</language><subject>AUXILIARY PROCESSES IN PHOTOGRAPHY ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES ; PHOTOGRAPHY ; PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES ; PHYSICS</subject><creationdate>2000</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20000428&amp;DB=EPODOC&amp;CC=JP&amp;NR=2000122212A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20000428&amp;DB=EPODOC&amp;CC=JP&amp;NR=2000122212A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SUNAGA TETSURO</creatorcontrib><creatorcontrib>IWASAKI KEIKO</creatorcontrib><title>HEAT DEVELOPABLE PHOTOSENSITIVE MATERIAL</title><description>PROBLEM TO BE SOLVED: To obtain a heat developable photosensitive material that suppresses the emission of a foul odor in heat development by specifying the amount of a solvent contained in a photosensitive material. SOLUTION: It is preferable that the amount of a solvent contained in a heat developable photosensitive material is made as small as possible from the viewpoint of a foul odor, but when the photosensitive material is dried up or nearly dried up, the heat developability deteriorates extremely. The amount of the residual solvent in the photosensitive material is adjusted to 10-100 mg/m3 so as to suppress the emission of a foul odor without deteriorating the heat developability. The amount may be adjusted by reducing the amount of a binder, raising drying temperature or prolonging drying time but the raising of drying temperature is not so favorable because it is accompanied by the increase of fog. The objective heat developable photosensitive material that suppresses the emission of a foul odor in heat development is obtained.</description><subject>AUXILIARY PROCESSES IN PHOTOGRAPHY</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2000</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNDwcHUMUXBxDXP18Q9wdPJxVQjw8A_xD3b1C_YM8QxzVfB1DHEN8nT04WFgTUvMKU7lhdLcDEpuriHOHrqpBfnxqcUFicmpeakl8V4BRgYGBoZGRkaGRo7GRCkCAF8oJJM</recordid><startdate>20000428</startdate><enddate>20000428</enddate><creator>SUNAGA TETSURO</creator><creator>IWASAKI KEIKO</creator><scope>EVB</scope></search><sort><creationdate>20000428</creationdate><title>HEAT DEVELOPABLE PHOTOSENSITIVE MATERIAL</title><author>SUNAGA TETSURO ; IWASAKI KEIKO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2000122212A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2000</creationdate><topic>AUXILIARY PROCESSES IN PHOTOGRAPHY</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>SUNAGA TETSURO</creatorcontrib><creatorcontrib>IWASAKI KEIKO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SUNAGA TETSURO</au><au>IWASAKI KEIKO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>HEAT DEVELOPABLE PHOTOSENSITIVE MATERIAL</title><date>2000-04-28</date><risdate>2000</risdate><abstract>PROBLEM TO BE SOLVED: To obtain a heat developable photosensitive material that suppresses the emission of a foul odor in heat development by specifying the amount of a solvent contained in a photosensitive material. SOLUTION: It is preferable that the amount of a solvent contained in a heat developable photosensitive material is made as small as possible from the viewpoint of a foul odor, but when the photosensitive material is dried up or nearly dried up, the heat developability deteriorates extremely. The amount of the residual solvent in the photosensitive material is adjusted to 10-100 mg/m3 so as to suppress the emission of a foul odor without deteriorating the heat developability. The amount may be adjusted by reducing the amount of a binder, raising drying temperature or prolonging drying time but the raising of drying temperature is not so favorable because it is accompanied by the increase of fog. The objective heat developable photosensitive material that suppresses the emission of a foul odor in heat development is obtained.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_epo_espacenet_JP2000122212A
source esp@cenet
subjects AUXILIARY PROCESSES IN PHOTOGRAPHY
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES
PHOTOGRAPHY
PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES
PHYSICS
title HEAT DEVELOPABLE PHOTOSENSITIVE MATERIAL
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-26T04%3A28%3A41IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=SUNAGA%20TETSURO&rft.date=2000-04-28&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJP2000122212A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true