PHOTODEGRADABLE ETHYLENE RESIN COMPOSITION
PROBLEM TO BE SOLVED: To obtain an ethylene resin composition which is adapted without detriment to moldability and the properties of a molding so that a molding made therefrom may be easily degraded by irradiation with ultraviolet light and can be easily disposed of when it becomes a waste by incor...
Gespeichert in:
| Hauptverfasser: | , |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | NAKA YOSHIHEI UEHARA YUMITO |
| description | PROBLEM TO BE SOLVED: To obtain an ethylene resin composition which is adapted without detriment to moldability and the properties of a molding so that a molding made therefrom may be easily degraded by irradiation with ultraviolet light and can be easily disposed of when it becomes a waste by incorporating a photosensitizer in a specified ethylene polymer. SOLUTION: 0.01-5 pts.wt., desirably, 0.03-3 pts.wt. photosensitizer is incorporated in 100 pts.wt. ethylene polymer obtained by reaction in the presence of a catalyst comprising a metallocene transition metal compound and at least one compound selected among an aluminumoxy compound, a Lewis acid, and an ionic compound which can convert the metallocene compound into a cation upon reaction therewith, having a melt flow rate of 0.01-1,000 g/10 min and a density of 0.85-0.97 g/cm3, containing at least 0.15, in total, internal unsaturations of formulae I to IV per 1,000 carbon atoms, and containing at least 0.1, in total, trisubstituted unsaturation of formula III or IV per 1,000 carbon atoms, and the mixture is kneaded at 170-250 deg.C, and granulated. In the formuae, R is 1C or higher hydrocarbon group. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2000109619A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2000109619A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2000109619A3</originalsourceid><addsrcrecordid>eNrjZNAK8PAP8XdxdQ9ydHF08nFVcA3xiPRx9XNVCHIN9vRTcPb3DfAP9gzx9PfjYWBNS8wpTuWF0twMSm6uIc4euqkF-fGpxQWJyal5qSXxXgFGBgYGhgaWZoaWjsZEKQIAtX0lVQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>PHOTODEGRADABLE ETHYLENE RESIN COMPOSITION</title><source>esp@cenet</source><creator>NAKA YOSHIHEI ; UEHARA YUMITO</creator><creatorcontrib>NAKA YOSHIHEI ; UEHARA YUMITO</creatorcontrib><description>PROBLEM TO BE SOLVED: To obtain an ethylene resin composition which is adapted without detriment to moldability and the properties of a molding so that a molding made therefrom may be easily degraded by irradiation with ultraviolet light and can be easily disposed of when it becomes a waste by incorporating a photosensitizer in a specified ethylene polymer. SOLUTION: 0.01-5 pts.wt., desirably, 0.03-3 pts.wt. photosensitizer is incorporated in 100 pts.wt. ethylene polymer obtained by reaction in the presence of a catalyst comprising a metallocene transition metal compound and at least one compound selected among an aluminumoxy compound, a Lewis acid, and an ionic compound which can convert the metallocene compound into a cation upon reaction therewith, having a melt flow rate of 0.01-1,000 g/10 min and a density of 0.85-0.97 g/cm3, containing at least 0.15, in total, internal unsaturations of formulae I to IV per 1,000 carbon atoms, and containing at least 0.1, in total, trisubstituted unsaturation of formula III or IV per 1,000 carbon atoms, and the mixture is kneaded at 170-250 deg.C, and granulated. In the formuae, R is 1C or higher hydrocarbon group.</description><edition>7</edition><language>eng</language><subject>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G ; CHEMISTRY ; COMPOSITIONS BASED THEREON ; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS ; GENERAL PROCESSES OF COMPOUNDING ; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS ; METALLURGY ; ORGANIC MACROMOLECULAR COMPOUNDS ; THEIR PREPARATION OR CHEMICAL WORKING-UP ; USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS ; WORKING-UP</subject><creationdate>2000</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20000418&DB=EPODOC&CC=JP&NR=2000109619A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25562,76317</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20000418&DB=EPODOC&CC=JP&NR=2000109619A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>NAKA YOSHIHEI</creatorcontrib><creatorcontrib>UEHARA YUMITO</creatorcontrib><title>PHOTODEGRADABLE ETHYLENE RESIN COMPOSITION</title><description>PROBLEM TO BE SOLVED: To obtain an ethylene resin composition which is adapted without detriment to moldability and the properties of a molding so that a molding made therefrom may be easily degraded by irradiation with ultraviolet light and can be easily disposed of when it becomes a waste by incorporating a photosensitizer in a specified ethylene polymer. SOLUTION: 0.01-5 pts.wt., desirably, 0.03-3 pts.wt. photosensitizer is incorporated in 100 pts.wt. ethylene polymer obtained by reaction in the presence of a catalyst comprising a metallocene transition metal compound and at least one compound selected among an aluminumoxy compound, a Lewis acid, and an ionic compound which can convert the metallocene compound into a cation upon reaction therewith, having a melt flow rate of 0.01-1,000 g/10 min and a density of 0.85-0.97 g/cm3, containing at least 0.15, in total, internal unsaturations of formulae I to IV per 1,000 carbon atoms, and containing at least 0.1, in total, trisubstituted unsaturation of formula III or IV per 1,000 carbon atoms, and the mixture is kneaded at 170-250 deg.C, and granulated. In the formuae, R is 1C or higher hydrocarbon group.</description><subject>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G</subject><subject>CHEMISTRY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>COMPOSITIONS OF MACROMOLECULAR COMPOUNDS</subject><subject>GENERAL PROCESSES OF COMPOUNDING</subject><subject>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</subject><subject>METALLURGY</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><subject>USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS</subject><subject>WORKING-UP</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2000</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNAK8PAP8XdxdQ9ydHF08nFVcA3xiPRx9XNVCHIN9vRTcPb3DfAP9gzx9PfjYWBNS8wpTuWF0twMSm6uIc4euqkF-fGpxQWJyal5qSXxXgFGBgYGhgaWZoaWjsZEKQIAtX0lVQ</recordid><startdate>20000418</startdate><enddate>20000418</enddate><creator>NAKA YOSHIHEI</creator><creator>UEHARA YUMITO</creator><scope>EVB</scope></search><sort><creationdate>20000418</creationdate><title>PHOTODEGRADABLE ETHYLENE RESIN COMPOSITION</title><author>NAKA YOSHIHEI ; UEHARA YUMITO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2000109619A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2000</creationdate><topic>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G</topic><topic>CHEMISTRY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>COMPOSITIONS OF MACROMOLECULAR COMPOUNDS</topic><topic>GENERAL PROCESSES OF COMPOUNDING</topic><topic>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</topic><topic>METALLURGY</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><topic>USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS</topic><topic>WORKING-UP</topic><toplevel>online_resources</toplevel><creatorcontrib>NAKA YOSHIHEI</creatorcontrib><creatorcontrib>UEHARA YUMITO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>NAKA YOSHIHEI</au><au>UEHARA YUMITO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PHOTODEGRADABLE ETHYLENE RESIN COMPOSITION</title><date>2000-04-18</date><risdate>2000</risdate><abstract>PROBLEM TO BE SOLVED: To obtain an ethylene resin composition which is adapted without detriment to moldability and the properties of a molding so that a molding made therefrom may be easily degraded by irradiation with ultraviolet light and can be easily disposed of when it becomes a waste by incorporating a photosensitizer in a specified ethylene polymer. SOLUTION: 0.01-5 pts.wt., desirably, 0.03-3 pts.wt. photosensitizer is incorporated in 100 pts.wt. ethylene polymer obtained by reaction in the presence of a catalyst comprising a metallocene transition metal compound and at least one compound selected among an aluminumoxy compound, a Lewis acid, and an ionic compound which can convert the metallocene compound into a cation upon reaction therewith, having a melt flow rate of 0.01-1,000 g/10 min and a density of 0.85-0.97 g/cm3, containing at least 0.15, in total, internal unsaturations of formulae I to IV per 1,000 carbon atoms, and containing at least 0.1, in total, trisubstituted unsaturation of formula III or IV per 1,000 carbon atoms, and the mixture is kneaded at 170-250 deg.C, and granulated. In the formuae, R is 1C or higher hydrocarbon group.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng |
| recordid | cdi_epo_espacenet_JP2000109619A |
| source | esp@cenet |
| subjects | AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G CHEMISTRY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS GENERAL PROCESSES OF COMPOUNDING MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS WORKING-UP |
| title | PHOTODEGRADABLE ETHYLENE RESIN COMPOSITION |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-10T06%3A15%3A58IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=NAKA%20YOSHIHEI&rft.date=2000-04-18&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJP2000109619A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |