HIGH PURITY TITANIUM SHEET FOR TITANIUM TARGET MATERIAL AND ITS PRODUCTION

PROBLEM TO BE SOLVED: To obtain a target material dense in a sheet face metallic structure, also uniform in a macro-structure, and capable of forming a titanium-adhered film uniform in film thickness and orientation properties by sputtering by allowing it to have a cold-worked structure and moreover...

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Hauptverfasser: FUJII HIDEKI, CHIBA MASAO, KAWAHARA YOSHINAO, ISHII MITSUO, NAGAI ISAO
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creator FUJII HIDEKI
CHIBA MASAO
KAWAHARA YOSHINAO
ISHII MITSUO
NAGAI ISAO
description PROBLEM TO BE SOLVED: To obtain a target material dense in a sheet face metallic structure, also uniform in a macro-structure, and capable of forming a titanium-adhered film uniform in film thickness and orientation properties by sputtering by allowing it to have a cold-worked structure and moreover specifying the area ratio of mechanical twin crystals in the optional L cross-section. SOLUTION: A high purity titanium material is hot-rolled, is annealed in the air at need and is thereafter cold-rolled while scale is kept adhered on the surface. At this time, while the revolution speed Rc of a rolling roll is controlled to the range shown by the inequality of Rc=6%. In this way, a cold rolled sheet having a cold-worked structure, and in which the area ratio of mechanical twin crystals in the total sheet thickness cross-section in the optional L cross-section is >=25% is obtd., and it is moreover subjected to annealing at need to obtain a cold rolled and annealed sheet having a recrystalized structure, and in which the area ratio of the colony structure in the optional face parallel to the sheet face is
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In this way, a cold rolled sheet having a cold-worked structure, and in which the area ratio of mechanical twin crystals in the total sheet thickness cross-section in the optional L cross-section is &gt;=25% is obtd., and it is moreover subjected to annealing at need to obtain a cold rolled and annealed sheet having a recrystalized structure, and in which the area ratio of the colony structure in the optional face parallel to the sheet face is &lt;10%, and a high purity titanium sheet for a titanium target material is obtd therefrom.</description><edition>7</edition><language>eng</language><subject>ALLOYS ; BASIC ELECTRIC ELEMENTS ; CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS ANDNON-FERROUS ALLOYS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; FERROUS OR NON-FERROUS ALLOYS ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SEMICONDUCTOR DEVICES ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION ; TREATMENT OF ALLOYS OR NON-FERROUS METALS</subject><creationdate>2000</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20000215&amp;DB=EPODOC&amp;CC=JP&amp;NR=2000045067A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,309,781,886,25568,76551</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20000215&amp;DB=EPODOC&amp;CC=JP&amp;NR=2000045067A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>FUJII HIDEKI</creatorcontrib><creatorcontrib>CHIBA MASAO</creatorcontrib><creatorcontrib>KAWAHARA YOSHINAO</creatorcontrib><creatorcontrib>ISHII MITSUO</creatorcontrib><creatorcontrib>NAGAI ISAO</creatorcontrib><title>HIGH PURITY TITANIUM SHEET FOR TITANIUM TARGET MATERIAL AND ITS PRODUCTION</title><description>PROBLEM TO BE SOLVED: To obtain a target material dense in a sheet face metallic structure, also uniform in a macro-structure, and capable of forming a titanium-adhered film uniform in film thickness and orientation properties by sputtering by allowing it to have a cold-worked structure and moreover specifying the area ratio of mechanical twin crystals in the optional L cross-section. SOLUTION: A high purity titanium material is hot-rolled, is annealed in the air at need and is thereafter cold-rolled while scale is kept adhered on the surface. At this time, while the revolution speed Rc of a rolling roll is controlled to the range shown by the inequality of Rc&lt;=1.59172-2.2541×106/ D4+4.21766×105/D3-2.54285×104/D2+7.89452×102/D, it is cold-rolled at a draft of &gt;=6%. 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SOLUTION: A high purity titanium material is hot-rolled, is annealed in the air at need and is thereafter cold-rolled while scale is kept adhered on the surface. At this time, while the revolution speed Rc of a rolling roll is controlled to the range shown by the inequality of Rc&lt;=1.59172-2.2541×106/ D4+4.21766×105/D3-2.54285×104/D2+7.89452×102/D, it is cold-rolled at a draft of &gt;=6%. In this way, a cold rolled sheet having a cold-worked structure, and in which the area ratio of mechanical twin crystals in the total sheet thickness cross-section in the optional L cross-section is &gt;=25% is obtd., and it is moreover subjected to annealing at need to obtain a cold rolled and annealed sheet having a recrystalized structure, and in which the area ratio of the colony structure in the optional face parallel to the sheet face is &lt;10%, and a high purity titanium sheet for a titanium target material is obtd therefrom.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record>
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subjects ALLOYS
BASIC ELECTRIC ELEMENTS
CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS ANDNON-FERROUS ALLOYS
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
FERROUS OR NON-FERROUS ALLOYS
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
SEMICONDUCTOR DEVICES
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
TREATMENT OF ALLOYS OR NON-FERROUS METALS
title HIGH PURITY TITANIUM SHEET FOR TITANIUM TARGET MATERIAL AND ITS PRODUCTION
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