HIGH PURITY TITANIUM SHEET FOR TITANIUM TARGET MATERIAL AND ITS PRODUCTION
PROBLEM TO BE SOLVED: To obtain a target material dense in a sheet face metallic structure, also uniform in a macro-structure, and capable of forming a titanium-adhered film uniform in film thickness and orientation properties by sputtering by allowing it to have a cold-worked structure and moreover...
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creator | FUJII HIDEKI CHIBA MASAO KAWAHARA YOSHINAO ISHII MITSUO NAGAI ISAO |
description | PROBLEM TO BE SOLVED: To obtain a target material dense in a sheet face metallic structure, also uniform in a macro-structure, and capable of forming a titanium-adhered film uniform in film thickness and orientation properties by sputtering by allowing it to have a cold-worked structure and moreover specifying the area ratio of mechanical twin crystals in the optional L cross-section. SOLUTION: A high purity titanium material is hot-rolled, is annealed in the air at need and is thereafter cold-rolled while scale is kept adhered on the surface. At this time, while the revolution speed Rc of a rolling roll is controlled to the range shown by the inequality of Rc=6%. In this way, a cold rolled sheet having a cold-worked structure, and in which the area ratio of mechanical twin crystals in the total sheet thickness cross-section in the optional L cross-section is >=25% is obtd., and it is moreover subjected to annealing at need to obtain a cold rolled and annealed sheet having a recrystalized structure, and in which the area ratio of the colony structure in the optional face parallel to the sheet face is |
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SOLUTION: A high purity titanium material is hot-rolled, is annealed in the air at need and is thereafter cold-rolled while scale is kept adhered on the surface. At this time, while the revolution speed Rc of a rolling roll is controlled to the range shown by the inequality of Rc<=1.59172-2.2541×106/ D4+4.21766×105/D3-2.54285×104/D2+7.89452×102/D, it is cold-rolled at a draft of >=6%. In this way, a cold rolled sheet having a cold-worked structure, and in which the area ratio of mechanical twin crystals in the total sheet thickness cross-section in the optional L cross-section is >=25% is obtd., and it is moreover subjected to annealing at need to obtain a cold rolled and annealed sheet having a recrystalized structure, and in which the area ratio of the colony structure in the optional face parallel to the sheet face is <10%, and a high purity titanium sheet for a titanium target material is obtd therefrom.</description><edition>7</edition><language>eng</language><subject>ALLOYS ; BASIC ELECTRIC ELEMENTS ; CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS ANDNON-FERROUS ALLOYS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; FERROUS OR NON-FERROUS ALLOYS ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SEMICONDUCTOR DEVICES ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION ; TREATMENT OF ALLOYS OR NON-FERROUS METALS</subject><creationdate>2000</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20000215&DB=EPODOC&CC=JP&NR=2000045067A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,309,781,886,25568,76551</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20000215&DB=EPODOC&CC=JP&NR=2000045067A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>FUJII HIDEKI</creatorcontrib><creatorcontrib>CHIBA MASAO</creatorcontrib><creatorcontrib>KAWAHARA YOSHINAO</creatorcontrib><creatorcontrib>ISHII MITSUO</creatorcontrib><creatorcontrib>NAGAI ISAO</creatorcontrib><title>HIGH PURITY TITANIUM SHEET FOR TITANIUM TARGET MATERIAL AND ITS PRODUCTION</title><description>PROBLEM TO BE SOLVED: To obtain a target material dense in a sheet face metallic structure, also uniform in a macro-structure, and capable of forming a titanium-adhered film uniform in film thickness and orientation properties by sputtering by allowing it to have a cold-worked structure and moreover specifying the area ratio of mechanical twin crystals in the optional L cross-section. SOLUTION: A high purity titanium material is hot-rolled, is annealed in the air at need and is thereafter cold-rolled while scale is kept adhered on the surface. At this time, while the revolution speed Rc of a rolling roll is controlled to the range shown by the inequality of Rc<=1.59172-2.2541×106/ D4+4.21766×105/D3-2.54285×104/D2+7.89452×102/D, it is cold-rolled at a draft of >=6%. In this way, a cold rolled sheet having a cold-worked structure, and in which the area ratio of mechanical twin crystals in the total sheet thickness cross-section in the optional L cross-section is >=25% is obtd., and it is moreover subjected to annealing at need to obtain a cold rolled and annealed sheet having a recrystalized structure, and in which the area ratio of the colony structure in the optional face parallel to the sheet face is <10%, and a high purity titanium sheet for a titanium target material is obtd therefrom.</description><subject>ALLOYS</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS ANDNON-FERROUS ALLOYS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>FERROUS OR NON-FERROUS ALLOYS</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><subject>TREATMENT OF ALLOYS OR NON-FERROUS METALS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2000</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZPDy8HT3UAgIDfIMiVQI8Qxx9PMM9VUI9nB1DVFw8w9CCIU4BrkDxXwdQ1yDPB19FBz9XBQ8Q4IVAoL8XUKdQzz9_XgYWNMSc4pTeaE0N4OSm2uIs4duakF-fGpxQWJyal5qSbxXgJEBEJiYGpiZOxoTpQgA0JAt-A</recordid><startdate>20000215</startdate><enddate>20000215</enddate><creator>FUJII HIDEKI</creator><creator>CHIBA MASAO</creator><creator>KAWAHARA YOSHINAO</creator><creator>ISHII MITSUO</creator><creator>NAGAI ISAO</creator><scope>EVB</scope></search><sort><creationdate>20000215</creationdate><title>HIGH PURITY TITANIUM SHEET FOR TITANIUM TARGET MATERIAL AND ITS PRODUCTION</title><author>FUJII HIDEKI ; CHIBA MASAO ; KAWAHARA YOSHINAO ; ISHII MITSUO ; NAGAI ISAO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2000045067A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2000</creationdate><topic>ALLOYS</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS ANDNON-FERROUS ALLOYS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>FERROUS OR NON-FERROUS ALLOYS</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><topic>TREATMENT OF ALLOYS OR NON-FERROUS METALS</topic><toplevel>online_resources</toplevel><creatorcontrib>FUJII HIDEKI</creatorcontrib><creatorcontrib>CHIBA MASAO</creatorcontrib><creatorcontrib>KAWAHARA YOSHINAO</creatorcontrib><creatorcontrib>ISHII MITSUO</creatorcontrib><creatorcontrib>NAGAI ISAO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>FUJII HIDEKI</au><au>CHIBA MASAO</au><au>KAWAHARA YOSHINAO</au><au>ISHII MITSUO</au><au>NAGAI ISAO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>HIGH PURITY TITANIUM SHEET FOR TITANIUM TARGET MATERIAL AND ITS PRODUCTION</title><date>2000-02-15</date><risdate>2000</risdate><abstract>PROBLEM TO BE SOLVED: To obtain a target material dense in a sheet face metallic structure, also uniform in a macro-structure, and capable of forming a titanium-adhered film uniform in film thickness and orientation properties by sputtering by allowing it to have a cold-worked structure and moreover specifying the area ratio of mechanical twin crystals in the optional L cross-section. SOLUTION: A high purity titanium material is hot-rolled, is annealed in the air at need and is thereafter cold-rolled while scale is kept adhered on the surface. At this time, while the revolution speed Rc of a rolling roll is controlled to the range shown by the inequality of Rc<=1.59172-2.2541×106/ D4+4.21766×105/D3-2.54285×104/D2+7.89452×102/D, it is cold-rolled at a draft of >=6%. In this way, a cold rolled sheet having a cold-worked structure, and in which the area ratio of mechanical twin crystals in the total sheet thickness cross-section in the optional L cross-section is >=25% is obtd., and it is moreover subjected to annealing at need to obtain a cold rolled and annealed sheet having a recrystalized structure, and in which the area ratio of the colony structure in the optional face parallel to the sheet face is <10%, and a high purity titanium sheet for a titanium target material is obtd therefrom.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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subjects | ALLOYS BASIC ELECTRIC ELEMENTS CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS ANDNON-FERROUS ALLOYS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FERROUS OR NON-FERROUS ALLOYS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TREATMENT OF ALLOYS OR NON-FERROUS METALS |
title | HIGH PURITY TITANIUM SHEET FOR TITANIUM TARGET MATERIAL AND ITS PRODUCTION |
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