MANUFACTURE OF IMAGE FORMING DEVICE

PROBLEM TO BE SOLVED: To provide a manufacturing method of an image forming device whose portion from the surface of a spacer antistatic film to the depth about 100 is hardly affected an atmosphere in a step of assembling the image forming device. SOLUTION: This image forming device has a board that...

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Bibliographische Detailangaben
Hauptverfasser: TAKASE HIROMITSU, TAKAGI HIROTSUGU
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a manufacturing method of an image forming device whose portion from the surface of a spacer antistatic film to the depth about 100 is hardly affected an atmosphere in a step of assembling the image forming device. SOLUTION: This image forming device has a board that an electron emission element and wiring for driving the electron emission element are formed and a board formed an image forming member that an image is formed by the electron emitted from the electron emission element. These boards are opposed through a spacer 22. In a manufacturing method of the image forming device having this structure, subsequent to a step of coating an antistatic film 23a on a surface of a spacer board, an antioxidant sacrifice layer 23b is formed on the antistatic film 23a.