IMPIANTO PER L'OSSIDAZIONE TERMICA DI DISCHETTI DI SILICIO

The plant 1 comprises: a stove 3 having a first tube 4 along which flows an inert gas and trichloroethane and a second tube 6 within the first tube along which flows oxygen for the oxidisation of silicon disks 2, a heating member 7 fitted outside the first tube, a third tube 51 in which thermal deco...

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Bibliographische Detailangaben
Hauptverfasser: DORI LEONELLO, NEGRINI PAOLO
Format: Patent
Sprache:ita
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