A PROCESS FOR PREPARING ISOLATED IMPURITY OF ATOVAQUONE
The present invention provides a chemical process for preparing isolated impurity of Atovaquone, for example, Indene isomer of Atovaquone of Formula II. Formula II
Gespeichert in:
Hauptverfasser: | , , , |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | |
---|---|
container_issue | |
container_start_page | |
container_title | |
container_volume | |
creator | CHANIYARA, RAVI MERWADE, ARVIND YEKANATHSA RAFEEQ, MOHAMMAD DEO,KESHAV |
description | The present invention provides a chemical process for preparing isolated impurity of Atovaquone, for example, Indene isomer of Atovaquone of Formula II. Formula II |
format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_IN1221MUM2013A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>IN1221MUM2013A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_IN1221MUM2013A3</originalsourceid><addsrcrecordid>eNrjZDB3VAgI8nd2DQ5WcPMPArJdAxyDPP3cFTyD_X0cQ1xdFDx9A0KDPEMiFfzdFBxD_MMcA0P9_Vx5GFjTEnOKU3mhNDeDsptriLOHbmpBfnxqcUFicmpeakm8p5-hkZGhb6ivkYGhsaMxcaoA-Akpww</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>A PROCESS FOR PREPARING ISOLATED IMPURITY OF ATOVAQUONE</title><source>esp@cenet</source><creator>CHANIYARA, RAVI ; MERWADE, ARVIND YEKANATHSA ; RAFEEQ, MOHAMMAD ; DEO,KESHAV</creator><creatorcontrib>CHANIYARA, RAVI ; MERWADE, ARVIND YEKANATHSA ; RAFEEQ, MOHAMMAD ; DEO,KESHAV</creatorcontrib><description>The present invention provides a chemical process for preparing isolated impurity of Atovaquone, for example, Indene isomer of Atovaquone of Formula II. Formula II</description><language>eng</language><subject>ACYCLIC OR CARBOCYCLIC COMPOUNDS ; CHEMISTRY ; METALLURGY ; ORGANIC CHEMISTRY</subject><creationdate>2015</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20150417&DB=EPODOC&CC=IN&NR=1221MU2013A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20150417&DB=EPODOC&CC=IN&NR=1221MU2013A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>CHANIYARA, RAVI</creatorcontrib><creatorcontrib>MERWADE, ARVIND YEKANATHSA</creatorcontrib><creatorcontrib>RAFEEQ, MOHAMMAD</creatorcontrib><creatorcontrib>DEO,KESHAV</creatorcontrib><title>A PROCESS FOR PREPARING ISOLATED IMPURITY OF ATOVAQUONE</title><description>The present invention provides a chemical process for preparing isolated impurity of Atovaquone, for example, Indene isomer of Atovaquone of Formula II. Formula II</description><subject>ACYCLIC OR CARBOCYCLIC COMPOUNDS</subject><subject>CHEMISTRY</subject><subject>METALLURGY</subject><subject>ORGANIC CHEMISTRY</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2015</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDB3VAgI8nd2DQ5WcPMPArJdAxyDPP3cFTyD_X0cQ1xdFDx9A0KDPEMiFfzdFBxD_MMcA0P9_Vx5GFjTEnOKU3mhNDeDsptriLOHbmpBfnxqcUFicmpeakm8p5-hkZGhb6ivkYGhsaMxcaoA-Akpww</recordid><startdate>20150417</startdate><enddate>20150417</enddate><creator>CHANIYARA, RAVI</creator><creator>MERWADE, ARVIND YEKANATHSA</creator><creator>RAFEEQ, MOHAMMAD</creator><creator>DEO,KESHAV</creator><scope>EVB</scope></search><sort><creationdate>20150417</creationdate><title>A PROCESS FOR PREPARING ISOLATED IMPURITY OF ATOVAQUONE</title><author>CHANIYARA, RAVI ; MERWADE, ARVIND YEKANATHSA ; RAFEEQ, MOHAMMAD ; DEO,KESHAV</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_IN1221MUM2013A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2015</creationdate><topic>ACYCLIC OR CARBOCYCLIC COMPOUNDS</topic><topic>CHEMISTRY</topic><topic>METALLURGY</topic><topic>ORGANIC CHEMISTRY</topic><toplevel>online_resources</toplevel><creatorcontrib>CHANIYARA, RAVI</creatorcontrib><creatorcontrib>MERWADE, ARVIND YEKANATHSA</creatorcontrib><creatorcontrib>RAFEEQ, MOHAMMAD</creatorcontrib><creatorcontrib>DEO,KESHAV</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>CHANIYARA, RAVI</au><au>MERWADE, ARVIND YEKANATHSA</au><au>RAFEEQ, MOHAMMAD</au><au>DEO,KESHAV</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>A PROCESS FOR PREPARING ISOLATED IMPURITY OF ATOVAQUONE</title><date>2015-04-17</date><risdate>2015</risdate><abstract>The present invention provides a chemical process for preparing isolated impurity of Atovaquone, for example, Indene isomer of Atovaquone of Formula II. Formula II</abstract><oa>free_for_read</oa></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | |
ispartof | |
issn | |
language | eng |
recordid | cdi_epo_espacenet_IN1221MUM2013A |
source | esp@cenet |
subjects | ACYCLIC OR CARBOCYCLIC COMPOUNDS CHEMISTRY METALLURGY ORGANIC CHEMISTRY |
title | A PROCESS FOR PREPARING ISOLATED IMPURITY OF ATOVAQUONE |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-28T11%3A40%3A38IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=CHANIYARA,%20RAVI&rft.date=2015-04-17&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EIN1221MUM2013A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |