Wafer alignment method and system

Wafers are aligned with one another by reference to features formed on or in each wafer. A method includes forming a first pivot-notch, a first stop-notch, and a first bias-notch in a first wafer by reference to first features formed on or in the first wafer. Also formed is a second pivot-notch, a s...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	CAPELLA Richard, MAINS Peter, PRABHU Anmiv S, SAMIEE Kevan
Format:	Patent
Sprache:	eng ; heb
Online-Zugang:	Volltext bestellen
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