Source of Ions Flux

Improvement of technological process of ion doping, widening of functional facilities of ion doping equipment. 2. Essence The source of ions flux comprises in series disposed in cylindrical body towards its axis magnetron spraying device, disc target, collector with a slot, cylindrical ionization ch...

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Bibliographische Detailangaben
Hauptverfasser:	Berishvili, Zaur, Papishvili, Nodar
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	Improvement of technological process of ion doping, widening of functional facilities of ion doping equipment. 2. Essence The source of ions flux comprises in series disposed in cylindrical body towards its axis magnetron spraying device, disc target, collector with a slot, cylindrical ionization chamber, compensation and extraction electrodes. The ionization chamber axis is perpendicular to that of the body. The ionization chamber on the diametrically opposite sides has input and output slots having rectangular form disposed along the axis. The slot of the collector by its shape and size is identical to the openings of the ionization chamber. 3. Field of Application Electronic machine building. 2 fig.