Substrate processing apparatus

An apparatus for coating substrates by vapour deposition consists of a plurality of work stations in each of which is mounted an apertured mask which may be brought accurately into alignment with a substrate, a source of vaporizable material and a monitor slide which is coated at the same time as th...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: THEODOSEAU NICHOLAS, CORMIER FRANCIS SELMA DE, KAHAN GEORGE JULIUS, SILVA EDWARD M. DA
Format: Patent
Sprache:eng
Schlagworte:
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