Latex composition for dip-forming, method for preparing the same, and dip-formed article formed by the same
A method for preparing a latex composition for dip-forming, comprising: (a) preparing a monomer mixture including a conjugated diene-based monomer, a farnesene monomer, an ethylenically unsaturated nitrile monomer, and an ethylenically unsaturated acid monomer; (b) adding an additive including an em...
Gespeichert in:
| Hauptverfasser: | , , |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | Jeong Weon Han Sung Hun Choung Ha Jung Lee |
| description | A method for preparing a latex composition for dip-forming, comprising: (a) preparing a monomer mixture including a conjugated diene-based monomer, a farnesene monomer, an ethylenically unsaturated nitrile monomer, and an ethylenically unsaturated acid monomer; (b) adding an additive including an emulsifier and an inorganic solvent to the monomer mixture; and (c) polymerizing the monomer mixture to prepare a copolymer latex, wherein a weight ratio of the farnesene monomer to a total weight of the conjugated diene-based monomer and the farnesene monomer is 5 to 55%. The diene monomer is chosen from 1,3-butadiene, 1,3-pentadiene, isoprene, 2,3-dimethyl-1,3-butadiene and 2-ethyl-1,3-butadiene. The unsaturated nitrile monomer is chosen from acrylonitrile, methacrylonitrile, fumaronitrile, α-chloroacrylonitrile, α-cyano ethyl acrylonitrile. The acid monomer is chosen from methacrylic, acrylic, itaconic, maleic or fumaric acids, maleic citraconic anhydrides, styrene sulfonate, monobutyl fumarate, monobutyl maleate, mono-2-hydroxypropyl maleate. A molecular weight regulator, chosen from mercapans, halogenated hydrocarbons or disulfide compounds. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_GB2625880A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>GB2625880A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_GB2625880A3</originalsourceid><addsrcrecordid>eNqFirsKwkAQANNYiPoN7gckIBElrYqPwtI-rHeb5DB3u9xtoX9vkJDWaphh5tnrjkpvMOyFk1PHARqOYJ0UA70LbQ6etGP76xJJMA4VtCNI6CkHDHb6yQJGdaYnGPX5mdZlNmuwT7QaucjWl_PjdCtIuKYkaCiQ1tdjuS93VbU5bP8fX39XP70</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Latex composition for dip-forming, method for preparing the same, and dip-formed article formed by the same</title><source>esp@cenet</source><creator>Jeong Weon Han ; Sung Hun Choung ; Ha Jung Lee</creator><creatorcontrib>Jeong Weon Han ; Sung Hun Choung ; Ha Jung Lee</creatorcontrib><description>A method for preparing a latex composition for dip-forming, comprising: (a) preparing a monomer mixture including a conjugated diene-based monomer, a farnesene monomer, an ethylenically unsaturated nitrile monomer, and an ethylenically unsaturated acid monomer; (b) adding an additive including an emulsifier and an inorganic solvent to the monomer mixture; and (c) polymerizing the monomer mixture to prepare a copolymer latex, wherein a weight ratio of the farnesene monomer to a total weight of the conjugated diene-based monomer and the farnesene monomer is 5 to 55%. The diene monomer is chosen from 1,3-butadiene, 1,3-pentadiene, isoprene, 2,3-dimethyl-1,3-butadiene and 2-ethyl-1,3-butadiene. The unsaturated nitrile monomer is chosen from acrylonitrile, methacrylonitrile, fumaronitrile, α-chloroacrylonitrile, α-cyano ethyl acrylonitrile. The acid monomer is chosen from methacrylic, acrylic, itaconic, maleic or fumaric acids, maleic citraconic anhydrides, styrene sulfonate, monobutyl fumarate, monobutyl maleate, mono-2-hydroxypropyl maleate. A molecular weight regulator, chosen from mercapans, halogenated hydrocarbons or disulfide compounds.</description><language>eng</language><subject>ACCESSORIES ; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G ; CHEMISTRY ; COMPOSITIONS BASED THEREON ; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS ; DIAGNOSIS ; GENERAL PROCESSES OF COMPOUNDING ; HUMAN NECESSITIES ; HYGIENE ; IDENTIFICATION ; MEDICAL OR VETERINARY SCIENCE ; METALLURGY ; ORGANIC MACROMOLECULAR COMPOUNDS ; OUTERWEAR ; PROTECTIVE GARMENTS ; SURGERY ; THEIR PREPARATION OR CHEMICAL WORKING-UP ; WEARING APPAREL ; WORKING-UP</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240703&DB=EPODOC&CC=GB&NR=2625880A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240703&DB=EPODOC&CC=GB&NR=2625880A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Jeong Weon Han</creatorcontrib><creatorcontrib>Sung Hun Choung</creatorcontrib><creatorcontrib>Ha Jung Lee</creatorcontrib><title>Latex composition for dip-forming, method for preparing the same, and dip-formed article formed by the same</title><description>A method for preparing a latex composition for dip-forming, comprising: (a) preparing a monomer mixture including a conjugated diene-based monomer, a farnesene monomer, an ethylenically unsaturated nitrile monomer, and an ethylenically unsaturated acid monomer; (b) adding an additive including an emulsifier and an inorganic solvent to the monomer mixture; and (c) polymerizing the monomer mixture to prepare a copolymer latex, wherein a weight ratio of the farnesene monomer to a total weight of the conjugated diene-based monomer and the farnesene monomer is 5 to 55%. The diene monomer is chosen from 1,3-butadiene, 1,3-pentadiene, isoprene, 2,3-dimethyl-1,3-butadiene and 2-ethyl-1,3-butadiene. The unsaturated nitrile monomer is chosen from acrylonitrile, methacrylonitrile, fumaronitrile, α-chloroacrylonitrile, α-cyano ethyl acrylonitrile. The acid monomer is chosen from methacrylic, acrylic, itaconic, maleic or fumaric acids, maleic citraconic anhydrides, styrene sulfonate, monobutyl fumarate, monobutyl maleate, mono-2-hydroxypropyl maleate. A molecular weight regulator, chosen from mercapans, halogenated hydrocarbons or disulfide compounds.</description><subject>ACCESSORIES</subject><subject>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G</subject><subject>CHEMISTRY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>COMPOSITIONS OF MACROMOLECULAR COMPOUNDS</subject><subject>DIAGNOSIS</subject><subject>GENERAL PROCESSES OF COMPOUNDING</subject><subject>HUMAN NECESSITIES</subject><subject>HYGIENE</subject><subject>IDENTIFICATION</subject><subject>MEDICAL OR VETERINARY SCIENCE</subject><subject>METALLURGY</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>OUTERWEAR</subject><subject>PROTECTIVE GARMENTS</subject><subject>SURGERY</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><subject>WEARING APPAREL</subject><subject>WORKING-UP</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqFirsKwkAQANNYiPoN7gckIBElrYqPwtI-rHeb5DB3u9xtoX9vkJDWaphh5tnrjkpvMOyFk1PHARqOYJ0UA70LbQ6etGP76xJJMA4VtCNI6CkHDHb6yQJGdaYnGPX5mdZlNmuwT7QaucjWl_PjdCtIuKYkaCiQ1tdjuS93VbU5bP8fX39XP70</recordid><startdate>20240703</startdate><enddate>20240703</enddate><creator>Jeong Weon Han</creator><creator>Sung Hun Choung</creator><creator>Ha Jung Lee</creator><scope>EVB</scope></search><sort><creationdate>20240703</creationdate><title>Latex composition for dip-forming, method for preparing the same, and dip-formed article formed by the same</title><author>Jeong Weon Han ; Sung Hun Choung ; Ha Jung Lee</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_GB2625880A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2024</creationdate><topic>ACCESSORIES</topic><topic>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G</topic><topic>CHEMISTRY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>COMPOSITIONS OF MACROMOLECULAR COMPOUNDS</topic><topic>DIAGNOSIS</topic><topic>GENERAL PROCESSES OF COMPOUNDING</topic><topic>HUMAN NECESSITIES</topic><topic>HYGIENE</topic><topic>IDENTIFICATION</topic><topic>MEDICAL OR VETERINARY SCIENCE</topic><topic>METALLURGY</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>OUTERWEAR</topic><topic>PROTECTIVE GARMENTS</topic><topic>SURGERY</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><topic>WEARING APPAREL</topic><topic>WORKING-UP</topic><toplevel>online_resources</toplevel><creatorcontrib>Jeong Weon Han</creatorcontrib><creatorcontrib>Sung Hun Choung</creatorcontrib><creatorcontrib>Ha Jung Lee</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Jeong Weon Han</au><au>Sung Hun Choung</au><au>Ha Jung Lee</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Latex composition for dip-forming, method for preparing the same, and dip-formed article formed by the same</title><date>2024-07-03</date><risdate>2024</risdate><abstract>A method for preparing a latex composition for dip-forming, comprising: (a) preparing a monomer mixture including a conjugated diene-based monomer, a farnesene monomer, an ethylenically unsaturated nitrile monomer, and an ethylenically unsaturated acid monomer; (b) adding an additive including an emulsifier and an inorganic solvent to the monomer mixture; and (c) polymerizing the monomer mixture to prepare a copolymer latex, wherein a weight ratio of the farnesene monomer to a total weight of the conjugated diene-based monomer and the farnesene monomer is 5 to 55%. The diene monomer is chosen from 1,3-butadiene, 1,3-pentadiene, isoprene, 2,3-dimethyl-1,3-butadiene and 2-ethyl-1,3-butadiene. The unsaturated nitrile monomer is chosen from acrylonitrile, methacrylonitrile, fumaronitrile, α-chloroacrylonitrile, α-cyano ethyl acrylonitrile. The acid monomer is chosen from methacrylic, acrylic, itaconic, maleic or fumaric acids, maleic citraconic anhydrides, styrene sulfonate, monobutyl fumarate, monobutyl maleate, mono-2-hydroxypropyl maleate. A molecular weight regulator, chosen from mercapans, halogenated hydrocarbons or disulfide compounds.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng |
| recordid | cdi_epo_espacenet_GB2625880A |
| source | esp@cenet |
| subjects | ACCESSORIES AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G CHEMISTRY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS DIAGNOSIS GENERAL PROCESSES OF COMPOUNDING HUMAN NECESSITIES HYGIENE IDENTIFICATION MEDICAL OR VETERINARY SCIENCE METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS OUTERWEAR PROTECTIVE GARMENTS SURGERY THEIR PREPARATION OR CHEMICAL WORKING-UP WEARING APPAREL WORKING-UP |
| title | Latex composition for dip-forming, method for preparing the same, and dip-formed article formed by the same |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-22T15%3A09%3A12IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Jeong%20Weon%20Han&rft.date=2024-07-03&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EGB2625880A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |