Inline chamber metrology
Embodiments of the present disclosure relate to inspection of substrates undergoing vacuum processing. In one embodiment, a processing chamber includes a first view port to enable an emitter of electromagnetic radiation to illuminate a substrate in the processing chamber, a second view port to enabl...
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| creator | Prerna Sonthalia Goradia Robert Jan Visser Avishek Ghosh |
| description | Embodiments of the present disclosure relate to inspection of substrates undergoing vacuum processing. In one embodiment, a processing chamber includes a first view port to enable an emitter of electromagnetic radiation to illuminate a substrate in the processing chamber, a second view port to enable a detector to detect electromagnetic radiation scattered from the substrate, the electromagnetic radiation emitter, and the detector. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_GB2587940B</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>GB2587940B</sourcerecordid><originalsourceid>FETCH-epo_espacenet_GB2587940B3</originalsourceid><addsrcrecordid>eNrjZJDwzMvJzEtVSM5IzE1KLVLITS0pys_JT6_kYWBNS8wpTuWF0twM8m6uIc4euqkF-fGpxQWJyal5qSXx7k5GphbmliYGTsaEVQAAdakhhg</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Inline chamber metrology</title><source>esp@cenet</source><creator>Prerna Sonthalia Goradia ; Robert Jan Visser ; Avishek Ghosh</creator><creatorcontrib>Prerna Sonthalia Goradia ; Robert Jan Visser ; Avishek Ghosh</creatorcontrib><description>Embodiments of the present disclosure relate to inspection of substrates undergoing vacuum processing. In one embodiment, a processing chamber includes a first view port to enable an emitter of electromagnetic radiation to illuminate a substrate in the processing chamber, a second view port to enable a detector to detect electromagnetic radiation scattered from the substrate, the electromagnetic radiation emitter, and the detector.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES ; MEASURING ; METALLURGY ; PHYSICS ; SEMICONDUCTOR DEVICES ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION ; TESTING</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230614&DB=EPODOC&CC=GB&NR=2587940B$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76418</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230614&DB=EPODOC&CC=GB&NR=2587940B$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Prerna Sonthalia Goradia</creatorcontrib><creatorcontrib>Robert Jan Visser</creatorcontrib><creatorcontrib>Avishek Ghosh</creatorcontrib><title>Inline chamber metrology</title><description>Embodiments of the present disclosure relate to inspection of substrates undergoing vacuum processing. In one embodiment, a processing chamber includes a first view port to enable an emitter of electromagnetic radiation to illuminate a substrate in the processing chamber, a second view port to enable a detector to detect electromagnetic radiation scattered from the substrate, the electromagnetic radiation emitter, and the detector.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</subject><subject>MEASURING</subject><subject>METALLURGY</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJDwzMvJzEtVSM5IzE1KLVLITS0pys_JT6_kYWBNS8wpTuWF0twM8m6uIc4euqkF-fGpxQWJyal5qSXx7k5GphbmliYGTsaEVQAAdakhhg</recordid><startdate>20230614</startdate><enddate>20230614</enddate><creator>Prerna Sonthalia Goradia</creator><creator>Robert Jan Visser</creator><creator>Avishek Ghosh</creator><scope>EVB</scope></search><sort><creationdate>20230614</creationdate><title>Inline chamber metrology</title><author>Prerna Sonthalia Goradia ; Robert Jan Visser ; Avishek Ghosh</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_GB2587940B3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2023</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</topic><topic>MEASURING</topic><topic>METALLURGY</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><topic>TESTING</topic><toplevel>online_resources</toplevel><creatorcontrib>Prerna Sonthalia Goradia</creatorcontrib><creatorcontrib>Robert Jan Visser</creatorcontrib><creatorcontrib>Avishek Ghosh</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Prerna Sonthalia Goradia</au><au>Robert Jan Visser</au><au>Avishek Ghosh</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Inline chamber metrology</title><date>2023-06-14</date><risdate>2023</risdate><abstract>Embodiments of the present disclosure relate to inspection of substrates undergoing vacuum processing. In one embodiment, a processing chamber includes a first view port to enable an emitter of electromagnetic radiation to illuminate a substrate in the processing chamber, a second view port to enable a detector to detect electromagnetic radiation scattered from the substrate, the electromagnetic radiation emitter, and the detector.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng |
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| subjects | BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING METALLURGY PHYSICS SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TESTING |
| title | Inline chamber metrology |
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